SCHEMBL21935593

SCHEMBL21935593

O=C(c1cc(O)c(O)cc1O)c1c(O)cc(O)cc1O

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FASN P49327 1/20 0.58
CYP3A4 P08684 4/20 0.48
MEN1 O00255 3/20 0.48
KMT2A Q03164 3/20 0.48
HPGD P15428 2/20 0.48
PTGS1 P23219 1/20 0.43
DRD3 P35462 1/20 0.43
ACHE P22303 2/20 0.42
CES2 O00748 1/20 0.41
ALDH1A1 P00352 2/20 0.41
TSHR P16473 2/20 0.41
ALOX15 P16050 1/20 0.41
RECQL P46063 1/20 0.41
HSD17B10 Q99714 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
CHRNA7 P36544 1/20 0.41
CA12 O43570 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
CA7 P43166 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21935547 0.81 PTPN1 (0.45) FASNCYP3A4HPGDCES2ALDH1A1
SCHEMBL21935912 0.81 PTPN1 (0.50) FASNCYP3A4HPGDCES2ALDH1A1
SCHEMBL21935549 0.80 PTPN1 (0.46) FASNCYP3A4HPGDALDH1A1TSHR
SCHEMBL9640012 0.80 CES2 (0.61) FASNCYP3A4MEN1KMT2AHPGD
SCHEMBL6272879 0.80 FASN (0.75) FASNCYP3A4MEN1KMT2AHPGD
SCHEMBL7897387 0.80 HPGD (0.50) CYP3A4MEN1KMT2AHPGDCES2
SCHEMBL9638908 0.78 CA12 (0.57) FASNCYP3A4MEN1KMT2AHPGD
SCHEMBL21935563 0.78 NPC1 (0.46) FASNCYP3A4MEN1KMT2AHPGD
SCHEMBL9638930 0.78 FASN (0.54) FASNCYP3A4MEN1KMT2AHPGD
SCHEMBL759680 0.77 FASN (0.58) FASNCYP3A4MEN1KMT2AHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10894887-B2 Composition for forming film protecting against aqueous hydrogen peroxide solution NISSAN CHEMICAL CORPORATION (JP) 2021-01-19 US disclosed
US-20200131376-A1 COMPOSITION FOR FORMING FILM PROTECTING AGAINST AQUEOUS HYDROGEN PEROXIDE SOLUTION NISSAN CHEMICAL CORPORATION (JP) 2020-04-30 US disclosed