Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.52 |
| ▸ | TSHR | P16473 | 3/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
| ▸ | APEX1 | P27695 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | EPHX1 | P07099 | 5/20 | 0.34 |
| ▸ | MEN1 | O00255 | 2/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | ACHE | P22303 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13590585 | 0.94 | THRB (0.47) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL14582190 | 0.94 | TSHR (0.50) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL10093567 | 0.94 | THRB (0.47) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL4087586 | 0.93 | THRB (0.50) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL12511119 | 0.93 | TSHR (0.53) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL3250861 | 0.93 | TSHR (0.53) | THRBTSHRALDH1A1EPHX1MEN1 | |
| SCHEMBL13589407 | 0.93 | TSHR (0.53) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL8424339 | 0.93 | THRB (0.46) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL13589405 | 0.93 | TSHR (0.53) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL11837742 | 0.93 | THRB (0.46) | THRBTSHRALDH1A1POLBAPEX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 94 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-16 | — | — | US | disclosed |
| EP-4660704-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-20250355350-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-20 | — | — | US | disclosed |
| EP-4650874-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-19 | — | — | EP | disclosed |
| EP-4636011-A1 | POLYMER, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-10-22 | — | — | EP | disclosed |
| EP-4636485-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-10-22 | — | — | EP | disclosed |
| US-11892773-B2 | Photosensitive resin composition, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-06 | — | — | US | disclosed |
| US-11891472-B2 | Composition, production method for composition, and production method for unsaturated compound | RESONAC CORPORATION (JP) | 2024-02-06 | — | — | US | disclosed |
| EP-3398983-B1 | POLYMER OF POLYIMIDE PRECURSOR, POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS | SHINETSU CHEMICAL CO (JP) | 2023-09-27 | — | — | EP | disclosed |
| US-20220119585-A1 | COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND | SHOWA DENKO K.K. (JP) | 2022-04-21 | — | — | US | disclosed |
| US-20050244739-A1 | Highly heat-resistant, negative-type photosensitive resin composition | ASAHI KASEI EMD CORPORATION (JP) | 2005-11-03 | — | — | US | disclosed |
| EP-1536286-A1 | HIGHLY HEAT-RESISTANT, NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | Asahi Kasei EMD Corporation (JP) | 2005-06-01 | — | — | EP | disclosed |
| US-6171735-B1 | FORMED BY EXPOSING TO RADIATION NEGATIVE-ACTING PRINTING PLATE COMPRISING SUBSTRATE HAVING COATED THEREON PHOTOSENSITIVE COMPOSITION COMPRISING REACTIVE ACID FUNCTIONAL POLYMER, PHOTOINITIATOR, APPLYING FOUNTAIN SOLUTION TO LATENT ARTICLE | 3M INNOVATIVE PROPERTIES COMPANY | 2001-01-09 | — | — | US | disclosed |
| US-6027857-A | PHOTOCURABLE COMPOSITION COMPRISING ANIONIC ACRYLIC POLYMER CONTAINING ALLYL ISOCYANATE OR 2-ISOCYANATOETHYLMETHACRYLATE GROUPS AND A PHOTOINITIATOR | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 2000-02-22 | — | — | US | disclosed |
| EP-0823070-B1 | NEGATIVE-ACTING NO-PROCESS PRINTING PLATES | MINNESOTA MINING & MFG (US) | 1999-12-29 | — | — | EP | disclosed |
| US-5925497-A | COATING MADE BY REACTING ISOCYANATE GROUPS FROM ETHYLENICALLY UNSATURATED PHOTOCURABLE GROUPS WITH A CARBOXY GROUP OF A POLYALKENOIC ACID CURABLE UPON EXPOSURE TO RADIATION; NO PROCESSING REQUIRED PRIOR TO BEING RUN ON A PRESS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1999-07-20 | — | — | US | disclosed |
| US-5910395-A | COATING PHOTOSENSITIVE COMPOSITION ON SUBSTRATE, PHOTOCURING WITH RADIATION; PLATES DO NOT REQUIRE PROCESSING PRIOR TO BEING RUN ON PRESS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1999-06-08 | — | — | US | disclosed |
| US-5849462-A | Negative-acting no-process printing plates | MINNESOTA MINING & MANUFACTURING COMPANY (US) | 1998-12-15 | — | — | US | disclosed |
| EP-0823070-A1 | NEGATIVE-ACTING NO-PROCESS PRINTING PLATES | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1998-02-11 | — | — | EP | disclosed |
| WO-1996034316-A1 | NEGATIVE-ACTING NO-PROCESS PRINTING PLATES | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1996-10-31 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | ARCN1, PRDM9, LBR | THRB 3424/4885TSHR 3214/4885ALDH1A1 3706/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.