⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL867268 | 0.84 | — | — | |
| SCHEMBL27633653 | 0.79 | — | — | |
| SCHEMBL9098521 | 0.77 | — | — | |
| SCHEMBL31396169 | 0.77 | — | — | |
| SCHEMBL11275702 | 0.77 | — | — | |
| SCHEMBL1940675 | 0.76 | — | — | |
| SCHEMBL207668 | 0.76 | — | — | |
| SCHEMBL28266581 | 0.75 | — | — | |
| SCHEMBL25330205 | 0.74 | — | — | |
| Hydrochloric Acid SCHEMBL11244162 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1993333-B | Triazole derivatives | TAISHO PHARMACEUTICAL CO LTD | 2012-08-01 | — | — | CN | claimed |
| CN-107703716-A | Anticorrosive additive material and pattern formation method | 信越化学工业株式会社 | 2018-02-16 | — | — | CN | disclosed |
| US-8288072-B2 | Antireflection film; fast etching speed whcih reduces deformation; accuracy; 2,3-epoxypropyl methacrylate ester-styrene copolymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-16 | — | — | US | disclosed |
| CN-1993333-B | Triazole derivatives | TAISHO PHARMACEUTICAL CO LTD | 2012-08-01 | — | — | CN | disclosed |
| CN-101415687-B | Binding inhibitor of sphingosine-1-phosphate | TAISHO PHARMACEUTICAL CO.,LTD. (JP) | 2012-02-08 | — | — | CN | disclosed |
| US-8088554-B2 | Bottom resist layer composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2012-01-03 | — | — | US | disclosed |
| CN-101415691-B | Triazole derivatives | TAISHO PHARMACEUTICAL CO.,LTD. (JP) | 2011-12-14 | — | — | CN | disclosed |
| CN-101107333-B | Ink for ink jet, ink set for ink jet, and ink jet recording method | KONICA MINOLTA HOLDINGS INC | 2010-07-07 | — | — | CN | disclosed |
| US-7745104-B2 | Polymer having a hydrocarbon chain backbone and containing units derived from norbornadiene, indene, benzofuran, benzothiophene, acenaphthene, or vinyl pyrene, fluorene, phenanthrene, chrysene, naphthacene, pentacene, or acenaphthene; excellent etching resistance; shorter wavelengths | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-06-29 | — | — | US | disclosed |
| US-20100151382-A1 | Bottom resist layer composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-06-17 | — | — | US | disclosed |
| CN-101107333-A | Ink for ink jet, ink set for ink jet, and ink jet recording method | KONICA MINOLTA HOLDINGS INC (JP) | 2008-01-16 | — | — | CN | disclosed |
| CN-1993333-A | Triazole derivatives | TAISHO PHARMACEUTICAL CO LTD (JP) | 2007-07-04 | — | — | CN | disclosed |
| EP-1798599-A1 | Antireflection film composition, patterning process and substrate using the same | Shinetsu Chemical Co., Ltd. (JP) | 2007-06-20 | — | — | EP | disclosed |
| US-20070134916-A1 | Antireflection film composition, patterning process and substrate using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-06-14 | — | — | US | disclosed |
| US-7214743-B2 | Resist lower layer film material and method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-08 | — | — | US | disclosed |
| US-7186831-B2 | 5-halo-2-alkyl[1,2,4]triazolo[1,5-a]pyrimidin-7-amines | BAYER CROPSCIENCE LP (DE) | 2007-03-06 | — | — | US | disclosed |
| US-20060234158-A1 | Bottom resist layer composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-10-19 | — | — | US | disclosed |
| US-20040259037-A1 | Resist lower layer film material and method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-12-23 | — | — | US | disclosed |
| US-20040241577-A1 | Resist lower layer film material and method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-12-02 | — | — | US | disclosed |
| US-20040142943-A1 | Triazolopyrimidines | BAYER CROPSCIENCE AG (DE) | 2004-07-22 | — | — | US | disclosed |