⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL219556 | 0.84 | — | — | |
| SCHEMBL9098521 | 0.77 | — | — | |
| SCHEMBL11275702 | 0.77 | — | — | |
| Urea SCHEMBL8463108 | 0.75 | — | — | |
| SCHEMBL2841799 | 0.73 | — | — | |
| SCHEMBL9014288 | 0.72 | — | — | |
| SCHEMBL11571054 | 0.72 | — | — | |
| SCHEMBL3808514 | 0.72 | ALOX15 (0.31) | — | |
| SCHEMBL11597967 | 0.72 | — | — | |
| Methoxymethane SCHEMBL8591569 | 0.70 | ALOX15 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7235348-B2 | Water soluble negative tone photoresist | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2007-06-26 | — | — | US | claimed |
| US-20060137104-A1 | Method of producing fabric | ZHANG YU-GAO | 2006-06-29 | — | — | US | claimed |
| EP-1492918-A4 | METHOD OF PRODUCING FABRIC | GUANGDONG ESQUEL KNITTERS CO L (CN) | 2006-06-21 | — | — | EP | claimed |
| EP-1492918-A2 | METHOD OF PRODUCING FABRIC | Guangdong Esquel Kniiters Co., Ltd. (CN) | 2005-01-05 | — | — | EP | claimed |
| US-20040234897-A1 | Water soluble negative tone photoresist | TAIWAN SEMICONDUTOR MANUFACTURING CO. | 2004-11-25 | — | — | US | claimed |
| EP-1480081-A2 | Use of water soluble negative tone photoresist for producing closely spaced contact holes | CLARIANT INTERNATIONAL LTD. (CH) | 2004-11-24 | — | — | EP | claimed |
| US-20030135932-A1 | Method of producing fabric | GUANGDONG ESQUEL KNITTERS CO., LTD. (CN) | 2003-07-24 | — | — | US | claimed |
| WO-2003060222-A2 | METHOD OF PRODUCING FABRIC | GUANGDONG ESQUEL KNITTERS CO., LTD. (CN) | 2003-07-24 | — | — | WO | claimed |
| US-20030129538-A1 | Method for eliminating corner round profile of the RELACS process | MACRONIX INTERNATIONAL CO., LTD. | 2003-07-10 | — | — | US | claimed |
| US-5858620-A | Semiconductor device and method for manufacturing the same | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1999-01-12 | — | — | US | claimed |
| JP-56104958-A | — | — | None | — | — | JP | disclosed |
| EP-1398671-B1 | Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device | FUJITSU LTD (JP) | 2016-06-01 | — | — | EP | disclosed |
| US-9304399-B2 | Resist composition and method for producing semiconductor device | SONY CORPORATION (JP) | 2016-04-05 | — | — | US | disclosed |
| EP-2168008-B1 | SPACER LITHOGRAPHY | ADVANCED MICRO DEVICES INC (US) | 2014-11-26 | — | — | EP | disclosed |
| US-20140273513-A1 | RESIST COMPOSITION AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | SONY CORPORATION (JP) | 2014-09-18 | — | — | US | disclosed |
| CN-1221971-A | Semiconductor device and method for manufacturing the same | MITSUBISHI ELECTRIC CORP (JP) | 1999-07-07 | — | — | CN | disclosed |
| US-5858620-A | Semiconductor device and method for manufacturing the same | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1999-01-12 | — | — | US | disclosed |
| US-5306435-A | Dimensional stability, shrinkage inhibition during washing | NIHON JUNYAKU CO., LTD. (JP) | 1994-04-26 | — | — | US | disclosed |
| JP-S56104958-A | FIRE RETARDANT GLASS FIBER STRUCTURE AND ITS BINDER | SANWA CHEM:KK | 1981-08-21 | — | — | JP | disclosed |
| US-3963668-A | GLASS FIBERS, ALKOXYMETHYL UREAS | BASF AKTIENGESELLSCHAFT (DT) | 1976-06-15 | — | — | US | disclosed |