SCHEMBL21969920

SCHEMBL21969920

CCC(O)CN(c1ccccc1)c1ccc(C)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.51
POLB P06746 2/20 0.51
L3MBTL1 Q9Y468 1/20 0.51
APOBEC3A P31941 1/20 0.51
APOBEC3G Q9HC16 1/20 0.51
KMT2A Q03164 5/20 0.45
MEN1 O00255 3/20 0.45
ALDH1A1 P00352 2/20 0.45
HSD17B10 Q99714 2/20 0.43
ATM Q13315 1/20 0.43
MAPT P10636 2/20 0.41
TSHR P16473 1/20 0.41
MAPK1 P28482 1/20 0.41
AGER Q15109 1/20 0.41
CYP2C19 P33261 1/20 0.41
SLC6A2 P23975 1/20 0.39
SLC6A4 P31645 1/20 0.39
BACE1 P56817 2/20 0.39
ALOX15 P16050 1/20 0.39
PER2 O15055 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21970152 0.82 KDM4E (0.44) KDM4EPOLBL3MBTL1APOBEC3AAPOBEC3G
SCHEMBL21969561 0.82 KDM4E (0.41) KDM4EPOLBL3MBTL1APOBEC3AAPOBEC3G
SCHEMBL15871091 0.78 CYP2C19 (0.46) KDM4EPOLBL3MBTL1APOBEC3AAPOBEC3G
SCHEMBL3537961 0.78 CYP2C19 (0.41) KMT2AMEN1ALDH1A1ATMMAPT
SCHEMBL3536621 0.76 TSHR (0.44) KDM4EPOLBL3MBTL1APOBEC3AAPOBEC3G
SCHEMBL5609630 0.75 NR3C2 (0.53) POLBL3MBTL1ALDH1A1MAPTTSHR
SCHEMBL23758989 0.74 ALDH1A1 (0.43) KDM4EPOLBL3MBTL1APOBEC3AAPOBEC3G
SCHEMBL25076578 0.74 KMT2A (0.61) KDM4EPOLBKMT2AMEN1ALDH1A1
SCHEMBL11504772 0.74 KDM4E (0.45) KDM4EPOLBL3MBTL1APOBEC3AAPOBEC3G
SCHEMBL18642753 0.74 HTR2A (0.52) KDM4EPOLBL3MBTL1APOBEC3AAPOBEC3G

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11681217-B2 Photosensitive resin composition, photosensitive resin layer using the same and color filter SAMSUNG SDI CO., LTD. (KR) 2023-06-20 US disclosed
US-11681217-B2 Photosensitive resin composition, photosensitive resin layer using the same and color filter SAMSUNG SDI CO., LTD. (KR) 2023-06-20 US disclosed
US-20200142301-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER SAMSUNG SDI CO., LTD. (KR) 2020-05-07 US disclosed