SCHEMBL21976004

SCHEMBL21976004

C=C(C)C(=O)Oc1ccc2cc(C3(c4ccc5cc(O)ccc5c4)c4ccccc4-c4ccccc43)ccc2c1

nearest known ligand 0.42

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 9/20 0.42
ESR1 P03372 7/20 0.42
MEN1 O00255 7/20 0.42
HSP90AA1 P07900 1/20 0.42
ESR2 Q92731 5/20 0.41
CASP3 P42574 2/20 0.41
SENP8 Q96LD8 2/20 0.41
SENP7 Q9BQF6 2/20 0.41
SENP6 Q9GZR1 2/20 0.41
NPC1 O15118 1/20 0.41
ELANE P08246 1/20 0.40
PKM P14618 1/20 0.39
MAPT P10636 2/20 0.34
PDK2 Q15119 1/20 0.34
ATM Q13315 2/20 0.33
CYP3A4 P08684 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16137609 0.94 ELANE (0.45) KMT2AESR1MEN1HSP90AA1ESR2
SCHEMBL21976001 0.89 ELANE (0.39) KMT2AESR1MEN1ESR2NPC1
SCHEMBL16137705 0.89 ELANE (0.40) KMT2AESR1MEN1ESR2NPC1
SCHEMBL19399684 0.87 ELANE (0.39) KMT2AESR1MEN1ESR2NPC1
SCHEMBL19192970 0.86 ELANE (0.41) KMT2AESR1MEN1ESR2ELANE
SCHEMBL3017740 0.86 ELANE (0.49) KMT2AESR1MEN1ESR2ELANE
SCHEMBL21976064 0.85 HSP90AA1 (0.44) KMT2AESR1MEN1HSP90AA1ESR2
SCHEMBL14672793 0.84 ELANE (0.39) KMT2AESR1MEN1ESR2CASP3
SCHEMBL16137611 0.83 ELANE (0.44) KMT2AESR1MEN1ELANEMAPT
SCHEMBL16137706 0.83 ELANE (0.44) KMT2AMEN1NPC1ELANEMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230056225-A1 PHOTOSENSITIVE COMPOSITION, CURED PRODUCT, AND METHOD FOR PRODUCING CURED PRODUCT TOKYO OHKA KOGYO CO., LTD. (JP) 2023-02-23 US disclosed
US-20230038195-A1 PHOTOSENSITIVE COMPOSITION, CURED PRODUCT, AND METHOD FOR PRODUCING CURED PRODUCT TOKYO OHKA KOGYO CO., LTD. (JP) 2023-02-09 US disclosed
US-10829662-B2 Curable composition, cured product, cured film, display panel, and method for producing cured product TOKYO OHKA KOGYO CO., LTD. (JP) 2020-11-10 US disclosed
US-20200139433-A1 METHOD FOR PRODUCING SURFACE-MODIFIED METAL OXIDE FINE PARTICLE, METHOD FOR PRODUCING IMPROVED METAL OXIDE FINE PARTICLES, SURFACE-MODIFIED METAL OXIDE FINE PARTICLES, AND METAL OXIDE FINE PARTICLE DISPERSION LIQUID TOKYO OHKA KOGYO CO., LTD. (JP) 2020-05-07 US disclosed