Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL219927

N.N.N.N.[Ti].[Ti].[Ti].[Ti]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 554 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11984158-B2 Non-volatile static random access memory incorporating resistive random-access memory POWERCHIP SEMICONDUCTOR MANUFACTURING CORPORATION (TW) 2024-05-14 US claimed
CN-117888017-A Titanium nitride iron material and preparation method thereof 北京科技大学 2024-04-16 CN claimed
CN-116859504-A Composite structure optical fiber based on titanium nitride/titanium carbide heterojunction and preparation method thereof 深圳大学 2023-10-10 CN claimed
CN-116631471-A Nonvolatile static random access memory 力晶积成电子制造股份有限公司 2023-08-22 CN claimed
US-20230253037-A1 NON-VOLATILE STATIC RANDOM ACCESS MEMORY POWERCHIP SEMICONDUCTOR MANUFACTURING CORPORATION (TW) 2023-08-10 US claimed
CN-114824064-A Metal layer etching method applied to three-axis magnetic sensor 上海华虹宏力半导体制造有限公司 2022-07-29 CN claimed
US-10699913-B2 Manufacturing method for trench UNITED MICROELECTRONICS CORPORATION (TW) 2020-06-30 US claimed
US-20190131142-A1 MANUFACTURING METHOD FOR TRENCH UNITED MICROELECTRONICS CORPORATION (TW) 2019-05-02 US claimed
US-10199232-B2 Conductor line structure UNITED MICROELECTRONICS CORPORATION (TW) 2019-02-05 US claimed
CN-108807277-A Grid is around semiconductor devices and preparation method thereof 三星电子株式会社 2018-11-13 CN claimed
US-6475911-B1 Method of forming noble metal pattern MICRON TECHNOLOGY, INC. 2002-11-05 US claimed
US-20020155660-A1 Method for producing a microelectronic structure INFINEON TECHNOLOGIES AG (DE) 2002-10-24 US claimed
US-20020142581-A1 Assembly including semiconductor chip, conductive pad, conductive trace, connection joint, and insulative adhesive; conductive trace includes routing line and pillar; connection joint contacts and electrically connects routing line and pad INTERNATIONAL BUSINESS MACHINES CORPORATION 2002-10-03 US claimed
US-6436814-B1 Interconnection structure and method for fabricating same INTERNATIONAL BUSINESS MACHINES CORPORATION 2002-08-20 US claimed
CN-1343370-A Method for manufacturing microelectronic structure INFINEON TECHNOLOGIES AG (DE) 2002-04-03 CN claimed
US-6017662-A Method of reducing laser mark peeling UNITED MICROELECTRONICS CORP. (TW) 2000-01-25 US claimed
US-5789318-A REACTION TO FORM TITANIUM SILICIDE VARIAN ASSOCIATES, INC. (US) 1998-08-04 US claimed
US-5714251-A Magneto-optic memory device SHARP KABUSHIKI KAISHA (JP) 1998-02-03 US claimed
WO-1997031390-A1 USE OF TITANIUM HYDRIDE IN INTEGRATED CIRCUIT FABRICATION VARIAN ASSOCIATES, INC. (US) 1997-08-28 WO claimed
US-5449639-A Disposable metal anti-reflection coating process used together with metal dry/wet etch TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (TW) 1995-09-12 US claimed