⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4257983 | 1.00 | MEN1 (0.32) | — | |
| SCHEMBL220556 | 0.93 | — | — | |
| SCHEMBL221852 | 0.89 | MEN1 (0.38) | — | |
| SCHEMBL1247453 | 0.89 | MEN1 (0.38) | — | |
| SCHEMBL7696759 | 0.89 | MEN1 (0.38) | — | |
| SCHEMBL593115 | 0.89 | MEN1 (0.38) | — | |
| SCHEMBL8006097 | 0.89 | MEN1 (0.38) | — | |
| SCHEMBL218216 | 0.89 | MEN1 (0.38) | — | |
| SCHEMBL9371395 | 0.88 | MEN1 (0.36) | — | |
| SCHEMBL4255581 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11687003-B2 | Negative resist pattern-forming method, and composition for upper layer film formation | JSR CORPORATION (JP) | 2023-06-27 | — | — | US | disclosed |
| US-11340528-B2 | Production method of composition for resist top coat layer, method of forming resist pattern, production method of fluorine-containing resin, and method of improving water repellency of resist top coat layer | JSR CORPORATION (JP) | 2022-05-24 | — | — | US | disclosed |
| US-20210181630-A1 | PRODUCTION METHOD OF COMPOSITION FOR RESIST TOP COAT LAYER, METHOD OF FORMING RESIST PATTERN, PRODUCTION METHOD OF FLUORINE-CONTAINING RESIN, AND METHOD OF IMPROVING WATER REPELLENCY OF RESIST TOP COAT LAYER | JSR CORPORATION (JP) | 2021-06-17 | — | — | US | disclosed |
| US-20190004426-A1 | NEGATIVE RESIST PATTERN-FORMING METHOD, AND COMPOSITION FOR UPPER LAYER FILM FORMATION | JSR CORPORATION (JP) | 2019-01-03 | — | — | US | disclosed |
| US-10073344-B2 | Negative resist pattern-forming method, and composition for upper layer film formation | JSR CORPORATION (JP) | 2018-09-11 | — | — | US | disclosed |
| US-20160299432-A1 | NEGATIVE RESIST PATTERN-FORMING METHOD, AND COMPOSITION FOR UPPER LAYER FILM FORMATION | JSR CORPORATION (JP) | 2016-10-13 | — | — | US | disclosed |
| EP-1542975-B1 | 9-CYANO-SUBSTITUTED PERYLENE-3,4-DICARBOXYLIC ACID MONOIMIDES | BASF SE (DE) | 2016-03-09 | — | — | EP | disclosed |
| US-9268225-B2 | Composition, resist pattern-forming method, compound, method for production of compound, and polymer | JSR CORPORATION (JP) | 2016-02-23 | — | — | US | disclosed |
| US-9072791-B2 | Photostabilized pharmaceutical compositions | DENKI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 2015-07-07 | — | — | US | disclosed |
| US-20140248563-A1 | COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, METHOD FOR PRODUCTION OF COMPOUND, AND POLYMER | JSR CORPORATION (JP) | 2014-09-04 | — | — | US | disclosed |
| US-20070197465-A1 | Hyaluronic Acid-Methotrexate Conjugate | DENKI KAGAKU KABUSHIKI KAISHA (JP) | 2007-08-23 | — | — | US | disclosed |
| EP-1739097-A1 | HYALURONIC ACID/METHOTREXATE COMPOUND | DENKI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 2007-01-03 | — | — | EP | disclosed |
| EP-1724287-A1 | HYALURONIC ACID/METHOTREXATE COMPOUND | DENKI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 2006-11-22 | — | — | EP | disclosed |
| US-20060229385-A1 | 9-Cyano-Substituted Perylene-3, 4-Dicarboxylic Monoimides | BASF AKTIENGESELLSCHAFT (DE) | 2006-10-12 | — | — | US | disclosed |
| EP-1082963-A1 | REMEDIES FOR JOINT DISEASES BOUND TO HYALURONIC ACID | CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) | 2001-03-14 | — | — | EP | disclosed |
| US-5476848-A | Antihistamines | SANKYO COMPANY, LIMITED (JP) | 1995-12-19 | — | — | US | disclosed |
| US-5461051-A | Tetracyclic compounds having anti-allergic and anti-asthmatic activities and their use | SANKYO COMPANY, LIMITED (JP) | 1995-10-24 | — | — | US | disclosed |
| US-5362725-A | Antiallergens, antiasthmatic | SANKYO COMPANY, LIMITED (JP) | 1994-11-08 | — | — | US | disclosed |
| EP-0505014-A2 | Novel tetracyclic compounds having anti-allergic and anti-asthmatic activities, their preparation and use | Sankyo Company Limited (JP) | 1992-09-23 | — | — | EP | disclosed |
| EP-0421823-A2 | Novel tetracyclic compounds having anti-allergic and anti-asthmatic activities, their preparation and use | Sankyo Company Limited (JP) | 1991-04-10 | — | — | EP | disclosed |