SCHEMBL22006642

SCHEMBL22006642

O=C(OC(C(F)(F)F)C(F)(F)F)[C@H]1CCCC[C@H]1C(=O)OC(C(F)(F)F)C(F)(F)F

nearest known ligand 0.36

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.36
CYP3A4 P08684 1/20 0.36
MGLL Q99685 3/20 0.33
ABHD6 Q9BV23 7/20 0.32
FAAH O00519 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14295881 0.83 ACE (0.32)
SCHEMBL24397742 0.82 CES2 (0.39) MGLL
SCHEMBL21010615 0.82 CES2 (0.39) MGLL
SCHEMBL20182653 0.82 CES2 (0.39) MGLL
SCHEMBL6449948 0.81 PEPD (0.33)
SCHEMBL14707469 0.79 EPHX1 (0.33)
SCHEMBL11991265 0.79 SLC6A2 (0.35)
SCHEMBL12307782 0.78
SCHEMBL14838265 0.78
SCHEMBL22064102 0.78 GAA (0.41) MGLLABHD6FAAH

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11579528-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2023-02-14 US disclosed
US-20200159117-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2020-05-21 US disclosed