SCHEMBL220386

SCHEMBL220386

CC(=O)N1CC1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14145678 1.00
SCHEMBL24677876 0.97 TSHR (0.54)
SCHEMBL13993914 0.85 TSHR (0.45)
SCHEMBL24425196 0.85 TSHR (0.45)
SCHEMBL24660074 0.83 TSHR (0.43)
SCHEMBL6629964 0.82 ATM (0.41)
SCHEMBL20754267 0.82 ATM (0.41)
SCHEMBL6627764 0.80 LIPE (0.43)
SCHEMBL418951 0.80 ATM (0.59)
SCHEMBL16751022 0.80 ATM (0.59)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 106 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117015566-A Stabilizer composition, use of a stabilizer composition, method for stabilizing polycondensates against hydrolytic degradation, and hydrolytically stable compositions and mouldings or mouldings thereof 弗劳恩霍夫应用研究促进协会 2023-11-07 CN claimed
CN-105218762-B Novel organosilicon water repellent and preparation method thereof 广州中国科学院工业技术研究院 2018-06-29 CN claimed
CN-105218762-A Novel organosilicon water repllents and preparation method thereof INST INDUSTRY TECHNOLOGY GUANGZHOU & CAS 2016-01-06 CN claimed
US-9039941-B2 Conductive paste for screen printing DIC CORPORATION (JP) 2015-05-26 US claimed
CN-103880197-A Non-phosphorus environment-friendly corrosion and scale inhibitor used for landfill leachate and industrial circulating water treatment NINGXIA BIYUE TECHNOLOGY CO LTD 2014-06-25 CN claimed
EP-2960314-B1 POLISHING COMPOSITION AND METHOD FOR MANUFACTURING POLISHED ARTICLE FUJIMI INC (JP) 2024-06-26 EP disclosed
WO-2024043061-A1 POLISHING COMPOSITION 株式会社フジミインコーポレーテッド 2024-02-29 WO disclosed
US-11897081-B2 Method for polishing silicon substrate and polishing composition set FUJIMI INCORPORATED (JP) 2024-02-13 US disclosed
EP-3159915-B1 METHOD FOR POLISHING SILICON WAFER, POLISHING COMPOSITION, AND POLISHING COMPOSITION SET FUJIMI INC (JP) 2023-12-06 EP disclosed
EP-4279562-A1 POLISHING COMPOSITION Fujimi Incorporated (JP) 2023-11-22 EP disclosed
CN-117015566-A Stabilizer composition, use of a stabilizer composition, method for stabilizing polycondensates against hydrolytic degradation, and hydrolytically stable compositions and mouldings or mouldings thereof 弗劳恩霍夫应用研究促进协会 2023-11-07 CN disclosed
US-20230118811-A1 EXTERNAL SKIN PREPARATION KAO CORPORATION (JP) 2023-04-20 US disclosed
EP-1975200-A1 RUBBER COMPOSITION CONTAINING MODIFIED POLYBUTADIENE RUBBER AND TIRE Bridgestone Corporation (JP) 2008-10-01 EP disclosed
US-20080177017-A1 Modified Polymer, Rubber Composition, and Tire BRIDGESTONE CORPORATION (JP) 2008-07-24 US disclosed
CN-101160328-A Modified conjugated diene copolymer, rubber compositions and tires BRIDGESTONE CORP (JP) 2008-04-09 CN disclosed
EP-1873168-A1 MODIFIED CONJUGATED DIENE COPOLYMER, RUBBER COMPOSITIONS AND TIRES Bridgestone Corporation (JP) 2008-01-02 EP disclosed
CN-101094875-A Modified polymer, rubber composition, and tire BRIDGESTONE CORP (JP) 2007-12-26 CN disclosed
EP-1834966-A1 MODIFIED POLYMER, RUBBER COMPOSITION, AND TIRE Bridgestone Corporation (JP) 2007-09-19 EP disclosed
CN-1147252-A Acylated aminophenylsulfonylureas, processes for their preparation and their use as herbicides and plant growth regulators HOECHST SCHERING AGREVO GMBH (DE) 1997-04-09 CN disclosed
US-5349095-A Process for preparing hydroxyalkylbenzocyclobutenes THE DOW CHEMICAL COMPANY (US) 1994-09-20 US disclosed