⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14415261 | 0.69 | — | — | |
| SCHEMBL18799419 | 0.69 | — | — | |
| SCHEMBL438919 | 0.69 | — | — | |
| SCHEMBL14028633 | 0.69 | — | — | |
| SCHEMBL13586951 | 0.64 | MAPT (0.32) | — | |
| SCHEMBL12934464 | 0.64 | MAPT (0.32) | — | |
| SCHEMBL10691677 | 0.64 | — | — | |
| SCHEMBL2379574 | 0.64 | — | — | |
| SCHEMBL21567764 | 0.62 | — | — | |
| SCHEMBL21910750 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11829068-B2 | Resist composition, method of forming resist pattern, compound, and resin | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-28 | — | — | US | disclosed |
| US-11586111-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-02-21 | — | — | US | disclosed |
| US-20220121117-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND RESIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-04-21 | — | — | US | disclosed |
| US-20200174369-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-06-04 | — | — | US | disclosed |