SCHEMBL2207795

SCHEMBL2207795

C=C(C)C(=O)OCC(=O)OC(C1CCCC1)C(O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.33

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.33
TSHR P16473 1/20 0.33
PDK1 Q15118 1/20 0.31
PDK2 Q15119 1/20 0.31
PDK3 Q15120 1/20 0.31
PDK4 Q16654 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3080504 0.87 TSHR (0.34) ALDH1A1TSHR
SCHEMBL75130 0.85 PDK1 (0.36) PDK1PDK2PDK3PDK4
SCHEMBL75368 0.84 PDK1 (0.39) PDK1PDK2PDK3PDK4
SCHEMBL14204596 0.78 PDK1 (0.37) PDK1PDK2PDK3PDK4
SCHEMBL14204582 0.77 PDK1 (0.40) ALDH1A1TSHRPDK1PDK2PDK3
SCHEMBL14204585 0.76 PDK1 (0.36) ALDH1A1PDK1PDK2PDK3PDK4
SCHEMBL9610643 0.76 PDK1 (0.36) PDK1PDK2PDK3PDK4
SCHEMBL2207982 0.75 TSHR (0.40) ALDH1A1TSHR
SCHEMBL776348 0.75 PDK1 (0.38) PDK1PDK2PDK3PDK4
SCHEMBL2206739 0.73 TSHR (0.41) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7981589-B2 Fluorinated monomer, fluorinated polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-07-19 US disclosed
US-7981589-B2 Fluorinated monomer, fluorinated polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-07-19 US disclosed
US-7981589-B2 Fluorinated monomer, fluorinated polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-07-19 US disclosed
US-20090035699-A1 FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-05 US disclosed
US-20090035699-A1 FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-05 US disclosed
US-20090035699-A1 FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-05 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090035699-A1 FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS C1R, AFF1, HRH3 ALDH1A1 2055/4885TSHR 861/4885PDK1 4354/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.