Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.55 |
| ▸ | CYP3A4 | P08684 | 5/20 | 0.54 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.54 |
| ▸ | ATM | Q13315 | 1/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.48 |
| ▸ | CA2 | P00918 | 4/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.46 |
| ▸ | RECQL | P46063 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 3/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.43 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.43 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.43 |
| ▸ | MMP9 | P14780 | 1/20 | 0.41 |
| ▸ | MMP8 | P22894 | 1/20 | 0.41 |
| ▸ | MMP14 | P50281 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27941674 | 0.86 | TSHR (0.56) | TSHRCYP3A4TDP1ATMALDH1A1 | |
| SCHEMBL4998246 | 0.83 | CA1 (0.38) | TSHRCYP3A4TDP1ATMCA2 | |
| SCHEMBL19056006 | 0.83 | TSHR (0.59) | TSHRCYP3A4TDP1ATMALDH1A1 | |
| SCHEMBL6657558 | 0.82 | TSHR (0.63) | TSHRCYP3A4TDP1ATMALDH1A1 | |
| SCHEMBL257295 | 0.82 | CYP3A4 (0.70) | TSHRCYP3A4TDP1ATMALDH1A1 | |
| SCHEMBL16772 | 0.81 | TSHR (0.61) | TSHRCYP3A4TDP1ATMALDH1A1 | |
| SCHEMBL14577150 | 0.81 | CYP3A4 (0.60) | TSHRCYP3A4TDP1ATMALDH1A1 | |
| SCHEMBL1269088 | 0.81 | TSHR (0.61) | TSHRCYP3A4TDP1ATMALDH1A1 | |
| Charcoal, Activated SCHEMBL11214727 | 0.80 | TSHR (0.59) | TSHRCYP3A4TDP1ATMALDH1A1 | |
| SCHEMBL16412767 | 0.80 | TSHR (0.59) | TSHRCYP3A4TDP1ATMALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4613657-A | APROTIC SOLVENT ALKALI METAL ALKOXIDE, OPTICS, PAINTS, RESISTS | CENTRAL GLASS COMPANY, LIMITED (JP) | 1986-09-23 | — | — | US | claimed |
| US-9733564-B2 | Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions | MITSUBISHI CHEMICAL CORPORATION (JP) | 2017-08-15 | — | — | US | disclosed |
| US-9188857-B2 | Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon | MITSUBISHI RAYON CO., LTD. (JP) | 2015-11-17 | — | — | US | disclosed |
| US-8614283-B2 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2013-12-24 | — | — | US | disclosed |
| US-8580481-B2 | Resist polymer and resist composition | MITSUBISHI RAYON CO., LTD. (JP) | 2013-11-12 | — | — | US | disclosed |
| US-20130252181-A1 | RESIST POLYMER, PROCESS FOR PRODUCTION THEREOF, RESIST COMPOSITION, AND PROCESS FOR PRODUCTION OF SUBSTRATES WITH PATTERNS THEREON | MITSUBISHI RAYON CO., LTD. (JP) | 2013-09-26 | — | — | US | disclosed |
| US-20130224654-A1 | COPOLYMERS FOR LITHOGRAPHY AND METHOD FOR PRODUCING SAME, RESIST COMPOSITION, METHOD FOR PRODUCING SUBSTRATE WITH PATTERN FORMED THEREUPON, METHOD FOR EVALUATING COPOLYMERS, AND METHOD FOR ANALYZING COPOLYMER COMPOSITIONS | MITSUBISHI RAYON CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
| US-8476401-B2 | Resist polymer, process for production thereof, resist composition, and process for production of substrated with patterns thereon | MITSUBISHI RAYON CO., LTD. (JP) | 2013-07-02 | — | — | US | disclosed |
| US-20120315459-A1 | CARBON NANOTUBE SHEET AND PROCESS FOR PRODUCTION THEREOF | TAIYO NIPPON SANSO CORPORATION (JP) | 2012-12-13 | — | — | US | disclosed |
| US-8241829-B2 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2012-08-14 | — | — | US | disclosed |
| US-20090263743-A1 | RESIST POLYMER AND RESIST COMPOSITION | MITSUBISHI RAYON CO., LTD. (JP) | 2009-10-22 | — | — | US | disclosed |
| US-20090226851-A1 | (METH)ACRYLATE, POLYMER AND RESIST COMPOSITION | MITSUBISHI RAYON CO., LTD. (JP) | 2009-09-10 | — | — | US | disclosed |
| US-7575846-B2 | Resist polymer and resist composition | MITSUBISHI RAYON CO., LTD. (JP) | 2009-08-18 | — | — | US | disclosed |
| US-20090198065-A1 | RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER | MITSUBISHI RAYON CO., LTD. (JP) | 2009-08-06 | — | — | US | disclosed |
| US-20080032241-A1 | Resist Polymer, Process For Production Thereof, Resist Composition, And Process For Production Of Substrated With Patterns Thereon | MITSUBISHI RAYON CO., LTD. (JP) | 2008-02-07 | — | — | US | disclosed |
| US-20080003529-A1 | (Meth)Acrylate, Polymer and Resist Composition | MITSUBISHI RAYON CO., LTD. (JP) | 2008-01-03 | — | — | US | disclosed |
| US-20070190449-A1 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2007-08-16 | — | — | US | disclosed |
| US-20060127801-A1 | Resist polymer and resist composition | MITSUBISHI RAYON CO., LTD. (JP) | 2006-06-15 | — | — | US | disclosed |
| US-4613657-A | APROTIC SOLVENT ALKALI METAL ALKOXIDE, OPTICS, PAINTS, RESISTS | CENTRAL GLASS COMPANY, LIMITED (JP) | 1986-09-23 | — | — | US | disclosed |
| US-4609715-A | RADICALLY POLYMERIZED | CENTRAL GLASS COMPANY, LIMITED (JP) | 1986-09-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090198065-A1 | RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER | CHRM1, CHRM2, PKN2 | TSHR 1359/4885CYP3A4 1751/4885TDP1 2115/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.