Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.38 |
| ▸ | CA2 | P00918 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 5/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
| ▸ | ATM | Q13315 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | FAAH | O00519 | 9/20 | 0.33 |
| ▸ | ACE2 | Q9BYF1 | 1/20 | 0.33 |
| ▸ | CES2 | O00748 | 3/20 | 0.33 |
| ▸ | CES1 | P23141 | 5/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL221001 | 0.83 | TSHR (0.55) | CA1CA2TSHRCYP3A4ATM | |
| SCHEMBL8646938 | 0.81 | CA2 (0.44) | CA1CA2TSHRCYP3A4ATM | |
| SCHEMBL5011169 | 0.81 | FAAH (0.40) | CA1CA2FAAHCES2CES1 | |
| SCHEMBL1897951 | 0.80 | TSHR (0.58) | CA1CA2TSHRCYP3A4ATM | |
| SCHEMBL4338291 | 0.79 | TSHR (0.43) | TSHR | |
| SCHEMBL1959455 | 0.78 | TSHR (0.59) | TSHR | |
| SCHEMBL29220278 | 0.76 | CA2 (0.40) | CA1CA2TSHRCYP3A4ATM | |
| SCHEMBL5946579 | 0.76 | TSHR (0.42) | TSHRMAPT | |
| SCHEMBL221345 | 0.76 | TSHR (0.52) | TSHRATMTDP1FAAHCES2 | |
| SCHEMBL21723488 | 0.76 | FAAH (0.45) | CA1FAAHCES2CES1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10678132-B2 | Resin for hydrophobilizing resist surface, method for production thereof, and positive resist composition containing the resin | FUJIFILM CORPORATION (JP) | 2020-06-09 | — | — | US | disclosed |
| EP-1970760-B1 | Positive resist composition containing a resin for hydrophobilizing resist surface, method for production thereof | FUJIFILM CORP (JP) | 2012-12-26 | — | — | EP | disclosed |
| US-20080227025-A1 | Localized on resist film; peak area of a high molecular weight; flowability of immersion liquid in patterning by exposure; prevention of coating and development defects; resin has perfluoroalkyl, fluorinated alcohol, alkylsilyl structure, cyclic siloxane, sulfonimido and/or bis(carbonyl)methylene groups | FUJIFILM CORPORATION (JP) | 2008-09-18 | — | — | US | disclosed |
| EP-1970760-A1 | Resin for hydrophobilizing resist surface, method for production thereof, and positive resist composition containing the resin | FUJIFILM Corporation (JP) | 2008-09-17 | — | — | EP | disclosed |