SCHEMBL22116276

SCHEMBL22116276

CC[SiH](C(OC)OC)[Si](CC)(CC)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8511762 0.65
SCHEMBL8848879 0.65
SCHEMBL8849396 0.63
SCHEMBL28206922 0.61
SCHEMBL1547788 0.61
SCHEMBL8849373 0.56
SCHEMBL8849278 0.56
SCHEMBL19665460 0.55
SCHEMBL8849908 0.54
SCHEMBL11513242 0.54 LMNA (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118302476-A Stripping composition, articles made from stripping composition, and related methods 3M创新有限公司 2024-07-05 CN disclosed
WO-2023091407-A1 RELEASE COMPOSITION, ARTICLES PREPARED FROM THE RELEASE COMPOSITION, AND RELATED METHODS 3M INNOVATIVE PROPERTIES COMPANY (US) 2023-05-25 WO disclosed
CN-113330078-B Release layer and product containing release layer 3M创新有限公司 2022-12-02 CN disclosed
US-20210332269-A1 RELEASE LAYERS AND ARTICLES CONTAINING THEM 3M INNOVATIVE PROPERTIES COMPANY 2021-10-28 US disclosed
EP-3898859-A1 RELEASE LAYERS AND ARTICLES CONTAINING THEM 3M Innovative Properties Company (US) 2021-10-27 EP disclosed
CN-113330078-A Release layer and product containing release layer 3M创新有限公司 2021-08-31 CN disclosed
WO-2020128729-A1 RELEASE LAYERS AND ARTICLES CONTAINING THEM 3M INNOVATIVE PROPERTIES COMPANY (US) 2020-06-25 WO disclosed