SCHEMBL22147281

SCHEMBL22147281

Oc1ccc(-c2c(-c3ccccc3)cc(-c3cc(-c4cc(-c5cc(-c6ccccc6)c(-c6ccc(O)cc6)c(-c6ccccc6)c5-c5ccccc5)cc(-c5cc(-c6ccccc6)c(-c6ccccc6)c(-c6ccc(O)cc6)c5-c5ccccc5)c4)cc(-c4cc(-c5ccccc5)c(-c5ccccc5)c(-c5ccc(O)cc5)c4-c4ccccc4)c3)c(-c3ccccc3)c2-c2ccccc2)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP3 P08254 2/20 0.52
BCL2L1 Q07817 1/20 0.52
ABL1 P00519 3/20 0.52
ABCB1 P08183 3/20 0.52
BCR P11274 3/20 0.52
ALOX5 P09917 1/20 0.48
ESR1 P03372 6/20 0.48
MEN1 O00255 3/20 0.48
KMT2A Q03164 3/20 0.48
PDE4A P27815 2/20 0.47
PDE4B Q07343 2/20 0.47
PDE4C Q08493 2/20 0.47
PDE4D Q08499 2/20 0.47
ESR2 Q92731 5/20 0.46
BACE1 P56817 1/20 0.45
MMP2 P08253 1/20 0.44
USP7 Q93009 1/20 0.44
POLB P06746 1/20 0.44
HTT P42858 1/20 0.44
RAB9A P51151 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22147360 0.98 MMP3 (0.54) MMP3BCL2L1ABL1ABCB1BCR
SCHEMBL22147284 0.94 MMP3 (0.58) MMP3BCL2L1ABL1ABCB1BCR
SCHEMBL28689044 0.94 MMP3 (0.58) MMP3BCL2L1ABL1ABCB1BCR
SCHEMBL20323050 0.94 MMP3 (0.58) MMP3BCL2L1ABL1ABCB1BCR
SCHEMBL28931153 0.94 MMP3 (0.58) MMP3BCL2L1ABL1ABCB1BCR
SCHEMBL25617438 0.92 MMP3 (0.62) MMP3BCL2L1ABL1ABCB1BCR
SCHEMBL20323159 0.92 MMP3 (0.56) MMP3BCL2L1ABL1ABCB1BCR
SCHEMBL21667676 0.90 MMP3 (0.60) MMP3BCL2L1ABL1ABCB1BCR
SCHEMBL20323160 0.89 MMP3 (0.52) MMP3BCL2L1ABL1ABCB1BCR
SCHEMBL25617416 0.85 ESR2 (0.51) MMP3BCL2L1ABL1ABCB1BCR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200201185-A1 HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2020-06-25 US disclosed