SCHEMBL2218400

SCHEMBL2218400

COCc1c(O)ccc2ccccc12

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 3/20 0.63
CYP1A2 P05177 3/20 0.63
CYP2C9 P11712 1/20 0.63
CYP2C19 P33261 1/20 0.63
KDM4E B2RXH2 6/20 0.59
ALDH1A1 P00352 5/20 0.59
MAPT P10636 5/20 0.59
GAA P10253 4/20 0.59
TAAR1 Q96RJ0 1/20 0.59
TDP1 Q9NUW8 2/20 0.59
GLA P06280 1/20 0.54
HPGD P15428 1/20 0.54
HIF1A Q16665 2/20 0.54
ALOX12 P18054 1/20 0.54
PHLPP2 Q6ZVD8 1/20 0.54
KMT2A Q03164 8/20 0.51
LMNA P02545 1/20 0.51
MEN1 O00255 4/20 0.51
CRHBP P24387 1/20 0.49
CRHR2 Q13324 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3272925 0.85 HSD17B10 (0.68) HSD17B10CYP1A2CYP2C9CYP2C19KDM4E
SCHEMBL736665 0.79 HSD17B10 (0.41) HSD17B10CYP1A2CYP2C9CYP2C19KDM4E
SCHEMBL3361843 0.79 HSD17B10 (0.70) HSD17B10CYP1A2CYP2C9CYP2C19KDM4E
SCHEMBL29357214 0.78 HSD17B10 (1.00) HSD17B10CYP1A2CYP2C9CYP2C19KDM4E
SCHEMBL36762 0.78 HSD17B10 (1.00) HSD17B10CYP1A2CYP2C9CYP2C19KDM4E
SCHEMBL226196 0.78 HSD17B10 (0.76) HSD17B10CYP1A2CYP2C9CYP2C19KDM4E
SCHEMBL18819386 0.78 MAPT (0.40) HSD17B10CYP1A2CYP2C9CYP2C19KDM4E
SCHEMBL4646633 0.76 HTR2A (0.54) HSD17B10CYP1A2CYP2C9CYP2C19KDM4E
SCHEMBL761745 0.76 HSD17B10 (0.73) HSD17B10CYP1A2CYP2C9CYP2C19KDM4E
SCHEMBL27590138 0.76 MAPT (0.49) HSD17B10CYP1A2CYP2C9CYP2C19KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110177454-A1 RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL PANASONIC CORPORATION (JP) 2011-07-21 US claimed
EP-3133445-A1 CHEMICALLY AMPLIFIED RESIST MATERIAL OSAKA UNIVERSITY (JP) 2017-02-22 EP disclosed
US-20110177454-A1 RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL PANASONIC CORPORATION (JP) 2011-07-21 US disclosed