Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.73 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.73 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.73 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.73 |
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.68 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.68 |
| ▸ | GAA | P10253 | 5/20 | 0.68 |
| ▸ | MAPT | P10636 | 5/20 | 0.68 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.68 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.61 |
| ▸ | GLA | P06280 | 1/20 | 0.61 |
| ▸ | HPGD | P15428 | 1/20 | 0.61 |
| ▸ | PTPN22 | Q9Y2R2 | 1/20 | 0.56 |
| ▸ | CRHBP | P24387 | 1/20 | 0.54 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.54 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.53 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.53 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.53 |
| ▸ | LMNA | P02545 | 1/20 | 0.53 |
| ▸ | POLB | P06746 | 1/20 | 0.52 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29357214 | 0.84 | HSD17B10 (1.00) | HSD17B10CYP1A2CYP2C9CYP2C19KDM4E | |
| SCHEMBL226196 | 0.84 | HSD17B10 (0.76) | HSD17B10CYP1A2CYP2C9CYP2C19KDM4E | |
| SCHEMBL36762 | 0.84 | HSD17B10 (1.00) | HSD17B10CYP1A2CYP2C9CYP2C19KDM4E | |
| SCHEMBL30873471 | 0.83 | HSD17B10 (0.68) | HSD17B10CYP1A2CYP2C9CYP2C19KDM4E | |
| SCHEMBL4313850 | 0.83 | HSD17B10 (0.68) | HSD17B10CYP1A2CYP2C9CYP2C19KDM4E | |
| SCHEMBL11644647 | 0.82 | HSD17B10 (0.50) | HSD17B10CYP1A2CYP2C9CYP2C19KDM4E | |
| SCHEMBL2452503 | 0.81 | KDM4E (1.00) | HSD17B10CYP1A2CYP2C9CYP2C19KDM4E | |
| SCHEMBL4019720 | 0.81 | HSD17B10 (0.70) | HSD17B10CYP1A2CYP2C9CYP2C19KDM4E | |
| SCHEMBL11660676 | 0.81 | HSD17B10 (0.70) | HSD17B10CYP1A2CYP2C9CYP2C19KDM4E | |
| SCHEMBL4473108 | 0.81 | HSD17B10 (0.70) | HSD17B10CYP1A2CYP2C9CYP2C19KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 167 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115981100-B | Hydrofluoric acid-resistant protective material for lithography and lithography process thereof | 湖南梵鑫新材料股份有限公司 | 2026-05-12 | — | — | CN | claimed |
| CN-115981100-A | Hydrofluoric acid resistant protective material for photoetching and photoetching process thereof | 武汉梵佳鑫科技有限公司 | 2023-04-18 | — | — | CN | claimed |
| CN-113461884-B | Modified phenolic resin for photoresist and preparation method thereof | 浙江自立高分子化工材料有限公司 | 2022-07-05 | — | — | CN | claimed |
| CN-113773460-B | Phenolic resin for photoresist and preparation method thereof | 浙江自立高分子化工材料有限公司 | 2022-04-19 | — | — | CN | claimed |
| CN-113773460-A | Phenolic resin for photoresist and preparation method thereof | 浙江自立高分子化工材料有限公司 | 2021-12-10 | — | — | CN | claimed |
| CN-113461884-A | Modified phenolic resin for photoresist and preparation method thereof | 浙江自立高分子化工材料有限公司 | 2021-10-01 | — | — | CN | claimed |
| EP-3009497-B1 | CLEANSER COMPOSITION | LION CORP (JP) | 2018-11-21 | — | — | EP | claimed |
| EP-1290132-B1 | FABRIC CARE COMPOSITIONS AND SYSTEMS FOR DELIVERING CLEAN, FRESH SCENT IN A LIPOPHILIC FLUID TREATMENT PROCESS | PROCTER & GAMBLE (US) | 2008-04-30 | — | — | EP | claimed |
| JP-5310886-A | — | — | None | — | — | JP | disclosed |
| JP-6049402-A | — | — | None | — | — | JP | disclosed |
| CN-115981100-B | Hydrofluoric acid-resistant protective material for lithography and lithography process thereof | 湖南梵鑫新材料股份有限公司 | 2026-05-12 | — | — | CN | disclosed |
| CN-119059885-A | Method for extracting high-purity o-m-para-phenol from mixed cresol | 盐城工学院 | 2024-12-03 | — | — | CN | disclosed |
| EP-4106822-B1 | COMPOSITION COMPRISING MICRO-ENCAPSULATED MALODOR CONTROL AGENTS AND THEIR USE FOR REDUCING MALODORS | HENKEL AG & CO KGAA (DE) | 2024-04-17 | — | — | EP | disclosed |
| EP-3701003-B1 | SOLID FRAGRANCE-CONTAINING COMPOSITION | HENKEL AG & CO KGAA (DE) | 2024-02-14 | — | — | EP | disclosed |
| JP-2000072838-A | NAPHTHOL RESIN, EPOXY RESIN, EPOXY RESIN COMPOSITION AND CURED PRODUCT THEREOF | NIPPON KAYAKU CO LTD | 2000-03-07 | — | — | JP | disclosed |
| JP-2000038430-A | NAPHTHOL RESIN, EPOXY RESIN, EPOXY RESIN COMPOSITION AND ITS CURED PRODUCT | NIPPON KAYAKU CO LTD | 2000-02-08 | — | — | JP | disclosed |
| JP-H0649402-A | SOLDER RESIST INK COMPOSITION AND ITS CURED PRODUCT | NIPPON KAYAKU CO LTD | 1994-02-22 | — | — | JP | disclosed |
| JP-H05310886-A | NEW EPOXY RESIN, RESIN COMPOSITION, AND CURED ARTICLE | NIPPON KAYAKU CO LTD | 1993-11-22 | — | — | JP | disclosed |
| US-4119671-A | OXIDATION OF HYDROXYBENZYL ALCOHOLS, PLATINUM CATALYST, ACTIVATORS | BAYER AKTIENGESELLSCHAFT (DE) | 1978-10-10 | — | — | US | disclosed |
| US-4025553-A | Production of o-hydroxybenzyl alcohols | SHIONOGI & CO., LTD. (JA) | 1977-05-24 | — | — | US | disclosed |