SCHEMBL22187068

SCHEMBL22187068

CCCCCC(=O)SC(=O)C#Cc1ccc2c3c(cccc13)C(=O)N(OS(=O)(=O)C(F)(F)F)C2=O

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 4/20 0.38
▸ KMT2A Q03164 4/20 0.38
▸ MEN1 O00255 3/20 0.38
▸ POLB P06746 2/20 0.38
▸ L3MBTL1 Q9Y468 2/20 0.38
▸ HDAC1 Q13547 6/20 0.34
▸ HDAC6 Q9UBN7 6/20 0.34
▸ HDAC3 O15379 4/20 0.34
▸ HDAC11 Q96DB2 4/20 0.34
▸ HDAC8 Q9BY41 4/20 0.34
▸ NCOR2 Q9Y618 4/20 0.34
▸ HDAC7 Q8WUI4 2/20 0.34
▸ HDAC2 Q92769 2/20 0.34
▸ HDAC10 Q969S8 2/20 0.34
▸ HDAC5 Q9UQL6 2/20 0.34
▸ TDP1 Q9NUW8 2/20 0.33
▸ HTT P42858 3/20 0.33
▸ ALDH1A1 P00352 3/20 0.33
▸ LMNA P02545 1/20 0.33
▸ RGS12 O14924 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18069172 0.90 MAPT (0.40) MAPTKMT2AMEN1POLBL3MBTL1
SCHEMBL18069173 0.89 MAPT (0.39) MAPTKMT2AMEN1POLBL3MBTL1
SCHEMBL18069170 0.85 MAPT (0.38) MAPTKMT2AMEN1POLBL3MBTL1
SCHEMBL18069159 0.84 MAPT (0.39) MAPTKMT2AMEN1POLBL3MBTL1
SCHEMBL18069151 0.84 MAPT (0.38) MAPTKMT2AMEN1POLBL3MBTL1
SCHEMBL18069146 0.82 KCNH2 (0.42) MAPTKMT2AMEN1POLBL3MBTL1
SCHEMBL18069147 0.82 KCNH2 (0.42) MAPTKMT2AMEN1POLBL3MBTL1
SCHEMBL18069148 0.82 KCNH2 (0.42) MAPTKMT2AMEN1POLBL3MBTL1
SCHEMBL18069178 0.82 MEN1 (0.39) MAPTKMT2AMEN1POLBL3MBTL1
SCHEMBL18069157 0.81 MAPT (0.38) MAPTKMT2AMEN1POLBL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220026801-A1 CHEMICALLY AMPLIFIED POSITIVE -TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD OF MANUFACTURING PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD (JP) 2022-01-27 — — US disclosed
US-20200209748-A1 CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD OF MANUFACTURING PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD. (JP) 2020-07-02 — — US disclosed
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