Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 6/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.39 |
| ▸ | MAPT | P10636 | 4/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.39 |
| ▸ | POLB | P06746 | 2/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.37 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.37 |
| ▸ | BRD4 | O60885 | 6/20 | 0.35 |
| ▸ | USP2 | O75604 | 3/20 | 0.35 |
| ▸ | HTT | P42858 | 2/20 | 0.35 |
| ▸ | ATM | Q13315 | 2/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.35 |
| ▸ | RGS12 | O14924 | 1/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
| ▸ | TLR9 | Q9NR96 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.34 |
| ▸ | HPGD | P15428 | 2/20 | 0.34 |
| ▸ | CYP1B1 | Q16678 | 3/20 | 0.33 |
| ▸ | KEAP1 | Q14145 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18069148 | 0.96 | KCNH2 (0.42) | MEN1KMT2AMAPTL3MBTL1POLB | |
| SCHEMBL18069147 | 0.96 | KCNH2 (0.42) | MEN1KMT2AMAPTL3MBTL1POLB | |
| SCHEMBL18069146 | 0.96 | KCNH2 (0.42) | MEN1KMT2AMAPTL3MBTL1POLB | |
| SCHEMBL18069140 | 0.90 | TDP1 (0.34) | MEN1KMT2AMAPTL3MBTL1POLB | |
| SCHEMBL18174463 | 0.89 | MEN1 (0.37) | MEN1KMT2AMAPTL3MBTL1POLB | |
| SCHEMBL18069208 | 0.89 | TDP1 (0.34) | MEN1KMT2AMAPTL3MBTL1POLB | |
| SCHEMBL18069167 | 0.89 | TDP1 (0.39) | MEN1KMT2AMAPTL3MBTL1POLB | |
| SCHEMBL18069175 | 0.88 | TDP1 (0.40) | MEN1KMT2AMAPTL3MBTL1POLB | |
| SCHEMBL18069142 | 0.86 | KCNH2 (0.37) | MEN1KMT2AMAPTL3MBTL1POLB | |
| SCHEMBL18069168 | 0.86 | MAPT (0.37) | MEN1KMT2AMAPTL3MBTL1POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230314943-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST FILM USING THE SAME | MERCK PATENT GMBH (DE) | 2023-10-05 | — | — | US | disclosed |
| US-20230314943-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST FILM USING THE SAME | MERCK PATENT GMBH (DE) | 2023-10-05 | — | — | US | disclosed |
| WO-2023162552-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD FOR SUBSTRATE WITH TEMPLATE, AND PRODUCTION METHOD FOR PLATED ARTICLE | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| WO-2023162551-A1 | METHOD FOR PRODUCING PLATED SHAPED ARTICLE | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| US-20230004085-A1 | METHOD FOR MANUFACTURING CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PREMIX SOLUTION FOR PREPARING CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, METHOD FOR MANUFACTURING PHOTOSENSITIVE DRY FILM, AND METHOD FOR MANUFACTURING PATTERNED RESIST FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-01-05 | — | — | US | disclosed |
| US-20220163888-A1 | POSITIVE TYPE RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST PATTERN USING THE SAME | MERCK PATENT GMBH (DE) | 2022-05-26 | — | — | US | disclosed |
| US-20220026801-A1 | CHEMICALLY AMPLIFIED POSITIVE -TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD OF MANUFACTURING PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD (JP) | 2022-01-27 | — | — | US | disclosed |
| US-20200209748-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD OF MANUFACTURING PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-07-02 | — | — | US | disclosed |
| US-20200209739-A1 | CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-07-02 | — | — | US | disclosed |
| US-20200142307-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE AND METHOD OF MANUFACTURING PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-05-07 | — | — | US | disclosed |
| US-9709886-B2 | Sulfonic acid derivative compounds as photoacid generators in resist applications | Heraeus Precious Metals North America Daychem LLC (US) | 2017-07-18 | — | — | US | disclosed |
| US-9709886-B2 | Sulfonic acid derivative compounds as photoacid generators in resist applications | Heraeus Precious Metals North America Daychem LLC (US) | 2017-07-18 | — | — | US | disclosed |
| EP-3182203-A1 | A COMBINATION OF NIT DERIVATIVES WITH SENSITIZERS | Heraeus Precious Metals North America Daychem LLC (US) | 2017-06-21 | — | — | EP | disclosed |
| US-20170003587-A1 | SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS | HERAEUS EPURIO LLC | 2017-01-05 | — | — | US | disclosed |
| US-20170003587-A1 | SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS | HERAEUS EPURIO LLC | 2017-01-05 | — | — | US | disclosed |
| US-9477150-B2 | Sulfonic acid derivative compounds as photoacid generators in resist applications | Heraeus Precious Metals North America Daychem LLC (US) | 2016-10-25 | — | — | US | disclosed |
| US-9477150-B2 | Sulfonic acid derivative compounds as photoacid generators in resist applications | Heraeus Precious Metals North America Daychem LLC (US) | 2016-10-25 | — | — | US | disclosed |
| WO-2016148809-A1 | SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS | Heraeus Precious Metals North America Daychem LLC (US) | 2016-09-22 | — | — | WO | disclosed |
| US-20160266487-A1 | SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS | HERAEUS EPURIO LLC | 2016-09-15 | — | — | US | disclosed |
| US-20160266487-A1 | SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS | HERAEUS EPURIO LLC | 2016-09-15 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200209739-A1 | CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND COMPOUND | CUTA, RAD51, PCNA | MEN1 418/4885KMT2A 700/4885MAPT 2347/4885 |
| US-20160266487-A1 | SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS | ALAD, MPST, ASIC1 | MEN1 1317/4885KMT2A 1020/4885MAPT 3437/4885 |
| US-20170003587-A1 | SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS | ALAD, MPST, ASIC1 | MEN1 1317/4885KMT2A 1020/4885MAPT 3437/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.