SCHEMBL2219620

SCHEMBL2219620

C=C(C(=O)O)C1CCCC1CC

nearest known ligand 0.38

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
PEPD P12955 1/20 0.32
KDM2B Q8NHM5 4/20 0.30
SMN1; SMN2 Q16637 1/20 0.30
POLB P06746 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6724940 0.96 EPHX1 (0.31) SMN1; SMN2POLB
SCHEMBL15494112 0.79 PEPD (0.45) PEPD
SCHEMBL17827147 0.79 PEPD (0.45) PEPD
SCHEMBL23819458 0.79 PEPD (0.45) PEPD
SCHEMBL21207444 0.79 PEPD (0.45) PEPD
SCHEMBL11657254 0.78 GABRR1 (0.35)
SCHEMBL12942860 0.75 PEPD (0.41) PEPD
SCHEMBL15494108 0.75 PEPD (0.41) PEPD
SCHEMBL14340647 0.75 PEPD (0.41) PEPD
SCHEMBL2220507 0.74 EPHX1 (0.48) PEPDSMN1; SMN2POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110177454-A1 RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL PANASONIC CORPORATION (JP) 2011-07-21 US claimed
CN-104718026-A Hydrogenation catalyst composition and hydrogenation method using said hydrogenation catalyst composition ASAHI KASEI CHEMICALS CORP 2015-06-17 CN disclosed
CN-104640629-A Catalyst composition for hydrogenation and hydrogenation method using catalyst composition for hydrogenation ASAHI KASEI CHEMICALS CORP 2015-05-20 CN disclosed
US-20110177454-A1 RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL PANASONIC CORPORATION (JP) 2011-07-21 US disclosed