⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5804483 | 0.77 | — | — | |
| SCHEMBL10627054 | 0.77 | — | — | |
| SCHEMBL8269260 | 0.72 | — | — | |
| SCHEMBL2218395 | 0.72 | — | — | |
| SCHEMBL17370866 | 0.72 | — | — | |
| SCHEMBL9972644 | 0.72 | — | — | |
| SCHEMBL801785 | 0.72 | — | — | |
| SCHEMBL43778 | 0.71 | — | — | |
| SCHEMBL82518 | 0.71 | — | — | |
| SCHEMBL43134 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 163 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12183591-B2 | Etching gas compositions, methods of forming micropatterns, and methods of manufacturing semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-12-31 | — | — | US | claimed |
| CN-118557747-A | Conjugates of cell binding molecules and camptothecin analogs | 杭州多禧生物科技有限公司 | 2024-08-30 | — | — | CN | claimed |
| CN-118215676-A | Specific conjugation of antibody drug conjugates | 杭州多禧生物科技有限公司 | 2024-06-18 | — | — | CN | claimed |
| CN-220907219-U | Biological filter membrane filter equipment with high temperature resistant corrosion-resistant | 东阳市汉宸膜技术有限公司 | 2024-05-07 | — | — | CN | claimed |
| CN-220379453-U | Novel corrosion-resistant gas pressure balance membrane device | 东阳市汉宸膜技术有限公司 | 2024-01-23 | — | — | CN | claimed |
| CN-116925941-A | Pichia pastoris engineering bacteria using ferulic acid as substrate and application thereof in vanillin production | 中国农业科学院农产品加工研究所 | 2023-10-24 | — | — | CN | claimed |
| CN-116640712-A | Method for constructing vanillin self-regulating bi-directional transport system in escherichia coli to improve vanillin yield | 中国农业科学院农产品加工研究所 | 2023-08-25 | — | — | CN | claimed |
| WO-2023156482-A1 | THERMOSTABLE PHOTOPOLYMERS IN THE VISIBLE SPECTRAL RANGE AND PHOTOPOLYMER COMPOSITIONS CONTAINING SAME | COVESTRO DEUTSCHLAND AG (DE) | 2023-08-24 | — | — | WO | claimed |
| WO-2023156485-A1 | TRIARYLALKYL BORATE SALTS AS COINITIATORS IN NIR PHOTOPOLYMER COMPOSITIONS | COVESTRO DEUTSCHLAND AG (DE) | 2023-08-24 | — | — | WO | claimed |
| WO-2023156484-A1 | PHOTOPOLYMER COMPOSITIONS FOR THERMOSTABLE PHOTOPOLYMERS IN THE VISIBLE SPECTRAL RANGE | COVESTRO DEUTSCHLAND AG (DE) | 2023-08-24 | — | — | WO | claimed |
| WO-2008073790-A2 | GASEOUS DIELECTRICS WITH LOW GLOBAL WARMING POTENTIALS | HONEYWELL INTERNATIONAL INC. (US) | 2008-06-19 | — | — | WO | claimed |
| US-20080135817-A1 | Gaseous dielectrics with low global warming potentials | HONEYWELL INTERNATIONAL INC. | 2008-06-12 | — | — | US | claimed |
| EP-1377876-A4 | HIGH RESOLUTION RESISTS FOR NEXT GENERATION LITHOGRAPHIES | GONSALVES KENNETH E (US) | 2007-05-23 | — | — | EP | claimed |
| US-7008749-B2 | High resolution resists for next generation lithographies | THE UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE (US) | 2006-03-07 | — | — | US | claimed |
| EP-1377876-A1 | HIGH RESOLUTION RESISTS FOR NEXT GENERATION LITHOGRAPHIES | Gonsalves, Kenneth E. (US) | 2004-01-07 | — | — | EP | claimed |
| US-20020182541-A1 | High resolution resists for next generation lithographies | NATIONAL SCIENCE FOUNDATION | 2002-12-05 | — | — | US | claimed |
| WO-2002073308-A1 | HIGH RESOLUTION RESISTS FOR NEXT GENERATION LITHOGRAPHIES | UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE (US) | 2002-09-19 | — | — | WO | claimed |
| US-4656108-A | Patterned film of thiocarbonyl fluoride polymer | DAIKIN KOGYO CO., LTD. (JP) | 1987-04-07 | — | — | US | claimed |
| EP-0068488-B1 | RESIST AND PROCESS FOR FORMING RESIST PATTERN | Daikin Kogyo Co., Ltd. (JP) | 1985-06-12 | — | — | EP | claimed |
| EP-0068488-A1 | Resist and process for forming resist pattern | Daikin Kogyo Co., Ltd. (JP) | 1983-01-05 | — | — | EP | claimed |