SCHEMBL82518

SCHEMBL82518

F[P]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL43134 1.00
SCHEMBL27777048 1.00
SCHEMBL3125635 0.87
SCHEMBL4359144 0.87
SCHEMBL3458753 0.87
SCHEMBL1805 0.87
SCHEMBL17938717 0.87
SCHEMBL7159657 0.87
SCHEMBL8974431 0.87
SCHEMBL20537305 0.87

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1106 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260042669-A1 PURIFYING PHOSPHORUS HALIDE COMPOUNDS ENTEGRIS INC (US) 2026-02-12 US claimed
US-20260026282-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING LOW-TEMPERATURE PLASMA ETCHING PROCESS SAMSUNG ELECTRONICS CO, LTD. (KR) 2026-01-22 US claimed
US-20250279263-A1 ETCHING METHOD AND PLASMA PROCESSING APPARATUS TOKYO ELECTRON LIMITED (JP) 2025-09-04 US claimed
US-12400835-B2 Plasma processing method and plasma processing system TOKYO ELECTRON LIMITED (JP) 2025-08-26 US claimed
US-12368027-B2 Substrate processing method and substrate processing apparatus TOKYO ELECTRON LIMITED (JP) 2025-07-22 US claimed
CN-120202532-A Etching method and plasma processing apparatus 东京毅力科创株式会社 2025-06-24 CN claimed
CN-114560774-B Synthesis method of 2-fluoro-3-nitrobenzoic acid 九洲药业(杭州)有限公司 2025-05-06 CN claimed
CN-119833586-A Positive electrode active material, preparation method thereof, positive electrode plate, battery and electric equipment 宁德时代新能源科技股份有限公司 2025-04-15 CN claimed
CN-119746607-A Tail gas treatment device for phosphorus fluoride processing 全椒南大光电材料有限公司 2025-04-04 CN claimed
CN-119640313-A Preparation method of high-entropy phosphorus-fluoride nanoparticle catalyst, prepared catalyst and oxygen evolution electrode 郑州大学 2025-03-18 CN claimed
EP-0280938-B1 Antioxidant aromatic fluorophosphites ETHYL CORP (US) 1994-06-15 EP claimed
US-5284926-A Fluorine compound, chromium compound, silica support; polymerization catalyst PHILLIPS PETROLEUM COMPANY (US) 1994-02-08 US claimed
US-5136075-A Process for transhalogenating a halophosphorus compound with fluoride ETHYL CORPORATION (US) 1992-08-04 US claimed
US-5049691-A Process for transhalogenating a halophosphorous compound with anhydrous hydrogen fluoride ETHYL CORPORATION (US) 1991-09-17 US claimed
EP-0368651-A2 Epitaxial growth process and growing apparatus FUJITSU LIMITED (JP) 1990-05-16 EP claimed
US-4912155-A Containing substituted aryl group ETHYL CORPORATION (US) 1990-03-27 US claimed
EP-0357048-A2 Process for transhalogenating a halophosphorus compound with hydrogen fluoride ALBEMARLE CORPORATION (US) 1990-03-07 EP claimed
EP-0280938-A1 Antioxidant aromatic fluorophosphites ALBEMARLE CORPORATION (US) 1988-09-07 EP claimed
US-4495300-A FORMATION OF ZIRCON BY FIRING WITH COMPOUNDS OF ZIRCONIUM AND PHOSPHORUS; THERMAL SHOCK RESISTANCE AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY, MINISTRY OF INTERNATIONAL TRADE AND INDUSTRY (JP) 1985-01-22 US claimed
US-4465885-A ALKYLATION, OLIGOMERIZATION UOP INC. (US) 1984-08-14 US claimed