SCHEMBL22201004

SCHEMBL22201004

C=C(C)C(=O)Oc1cc(C)c(O)c(O)c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.41
CYP3A4 P08684 7/20 0.40
KMT2A Q03164 5/20 0.40
HPGD P15428 4/20 0.40
ALDH1A1 P00352 3/20 0.40
MAPK1 P28482 3/20 0.40
HSD17B10 Q99714 2/20 0.40
MEN1 O00255 2/20 0.40
ALOX15 P16050 1/20 0.40
POLB P06746 2/20 0.39
ATM Q13315 1/20 0.39
GLO1 Q04760 1/20 0.36
PRKCE Q02156 1/20 0.36
PTPN1 P18031 1/20 0.33
KDM4E B2RXH2 3/20 0.32
GAA P10253 2/20 0.32
MAPT P10636 2/20 0.32
TP53 P04637 1/20 0.32
HTT P42858 1/20 0.32
ACHE P22303 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL92324 0.91 ELANE (0.45) ELANECYP3A4KMT2AHPGDALDH1A1
SCHEMBL26348213 0.83 ELANE (0.41) ELANECYP3A4KMT2AHPGDALDH1A1
SCHEMBL18328820 0.82 LMNA (0.42) ELANECYP3A4KMT2AHPGDALDH1A1
SCHEMBL9627001 0.82 ELANE (0.46) ELANECYP3A4KMT2AHPGDALDH1A1
SCHEMBL16639591 0.80 ELANE (0.45) ELANECYP3A4KMT2AHPGDALDH1A1
SCHEMBL8151618 0.80 ELANE (0.47) ELANECYP3A4KMT2AHPGDALDH1A1
SCHEMBL15388430 0.79 ELANE (0.49) ELANECYP3A4KMT2AHPGDALDH1A1
SCHEMBL15388793 0.79 ELANE (0.49) ELANECYP3A4KMT2AATMKDM4E
SCHEMBL15357797 0.79 ELANE (0.53) ELANECYP3A4KMT2AALDH1A1MEN1
SCHEMBL18309865 0.79 ELANE (0.44) ELANECYP3A4KMT2AALDH1A1ATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230305398-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 US disclosed
US-20230305398-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 US disclosed
US-20200218154-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-07-09 US disclosed