SCHEMBL2220154

SCHEMBL2220154

COCOc1cccc(OCOC)c1OCOC

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 1/20 0.51
SMN1; SMN2 Q16637 2/20 0.50
TSHR P16473 3/20 0.42
LMNA P02545 3/20 0.42
CHRM2 P08172 2/20 0.42
CHRM1 P11229 1/20 0.42
ALOX15 P16050 1/20 0.42
ACHE P22303 1/20 0.42
KCNH2 Q12809 1/20 0.42
HIF1A Q16665 1/20 0.42
MAPK1 P28482 2/20 0.40
DRD2 P14416 1/20 0.39
DRD1 P21728 1/20 0.39
L3MBTL1 Q9Y468 2/20 0.38
POLB P06746 1/20 0.38
CHEK1 O14757 1/20 0.36
AURKA O14965 1/20 0.36
DAPK3 O43293 1/20 0.36
JAK2 O60674 1/20 0.36
ABL1 P00519 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28586196 0.88 SMN1; SMN2 (0.65) PTPN1SMN1; SMN2TSHRLMNAALOX15
SCHEMBL17919290 0.86 PTPN1 (0.45) PTPN1SMN1; SMN2TSHRLMNACHRM2
SCHEMBL8751787 0.86 PTPN1 (0.49) PTPN1SMN1; SMN2TSHRLMNAALOX15
SCHEMBL3671710 0.85 SMN1; SMN2 (0.55) PTPN1SMN1; SMN2TSHRMAPK1L3MBTL1
SCHEMBL8693467 0.82 PTPN1 (0.43) PTPN1SMN1; SMN2TSHRLMNACHRM2
SCHEMBL31151088 0.82 PTPN1 (0.43) PTPN1SMN1; SMN2DRD2DRD1
SCHEMBL30566658 0.82 PTPN1 (0.46) PTPN1SMN1; SMN2TSHRDRD2DRD1
SCHEMBL30741239 0.82 CA12 (0.48) PTPN1SMN1; SMN2LMNAL3MBTL1POLB
SCHEMBL30741241 0.82 CA12 (0.48) PTPN1SMN1; SMN2LMNAL3MBTL1POLB
SCHEMBL3185351 0.82 CA12 (0.48) PTPN1SMN1; SMN2LMNAL3MBTL1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110177454-A1 RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL PANASONIC CORPORATION (JP) 2011-07-21 US claimed
US-20110177454-A1 RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL PANASONIC CORPORATION (JP) 2011-07-21 US disclosed
EP-0579420-B1 Negative working resist material and pattern forming process WAKO PURE CHEM IND LTD (JP) 1997-03-05 EP disclosed
US-5389491-A Negative working resist composition MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1995-02-14 US disclosed
EP-0579420-A2 Negative working resist material and pattern forming process WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1994-01-19 EP disclosed