SCHEMBL2221010

SCHEMBL2221010

CC(C)(C)OC(=O)Oc1cccc(OC(=O)OC(C)(C)C)c1OC(=O)OC(C)(C)C

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 4/20 0.49
▸ KDM4E B2RXH2 2/20 0.41
▸ HSD17B10 Q99714 2/20 0.41
▸ HPGD P15428 1/20 0.41
▸ MAPK1 P28482 1/20 0.40
▸ BCHE P06276 1/20 0.37
▸ BRD4 O60885 1/20 0.36
▸ KDM1A O60341 1/20 0.36
▸ PTPN1 P18031 1/20 0.35
▸ EPHX2 P34913 2/20 0.35
▸ CA2 P00918 2/20 0.34
▸ CA12 O43570 1/20 0.34
▸ CA1 P00915 1/20 0.34
▸ CA7 P43166 1/20 0.34
▸ CA9 Q16790 1/20 0.34
▸ CA14 Q9ULX7 1/20 0.34
▸ ALDH1A1 P00352 1/20 0.34
▸ NFE2L2 Q16236 1/20 0.34
▸ DDB1 Q16531 1/20 0.33
▸ CRBN Q96SW2 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9791378 0.89 ELANE (0.46) ELANEKDM4EHSD17B10HPGDMAPK1
SCHEMBL8781901 0.85 SRC (0.42) ELANEKDM4EHSD17B10HPGDMAPK1
SCHEMBL4059205 0.85 ELANE (0.49) ELANEKDM4EHSD17B10HPGDMAPK1
SCHEMBL16785664 0.83 PTPN1 (0.46) ELANEKDM4EHSD17B10HPGDPTPN1
SCHEMBL8781816 0.83 HSD17B10 (0.39) ELANEKDM4EHSD17B10HPGDMAPK1
SCHEMBL2761277 0.81 ELANE (0.49) ELANEKDM4EHSD17B10HPGDKDM1A
SCHEMBL10342381 0.81 HSD17B10 (0.43) ELANEKDM4EHSD17B10HPGDMAPK1
SCHEMBL18263215 0.79 ELANE (0.47) ELANEHSD17B10BCHEBRD4KDM1A
SCHEMBL13244538 0.79 ELANE (0.47) ELANEKDM1ACA2ALDH1A1
SCHEMBL29391949 0.79 CA12 (0.48) ELANEKDM4EHSD17B10HPGDBCHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110177454-A1 RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL PANASONIC CORPORATION (JP) 2011-07-21 — — US claimed
US-20110177454-A1 RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL PANASONIC CORPORATION (JP) 2011-07-21 — — US disclosed
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