Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 1/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.52 |
| ▸ | GPR35 | Q9HC97 | 2/20 | 0.46 |
| ▸ | POLB | P06746 | 1/20 | 0.46 |
| ▸ | HTR2A | P28223 | 1/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.44 |
| ▸ | HPGD | P15428 | 3/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.44 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | GLA | P06280 | 1/20 | 0.44 |
| ▸ | EDNRA | P25101 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | RAD52 | P43351 | 1/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31326117 | 1.00 | EPHX1 (0.54) | EPHX1ALDH1A1GPR35POLBHTR2A | |
| SCHEMBL4647196 | 0.87 | ALDH1A1 (0.61) | EPHX1ALDH1A1L3MBTL1KDM4EHSD17B10 | |
| SCHEMBL29853925 | 0.87 | ALDH1A1 (0.61) | EPHX1ALDH1A1L3MBTL1KDM4EHSD17B10 | |
| SCHEMBL14277073 | 0.85 | EPHX1 (0.56) | EPHX1ALDH1A1GPR35POLBHTR2A | |
| SCHEMBL23198673 | 0.85 | EPHX1 (0.45) | EPHX1ALDH1A1GPR35POLBL3MBTL1 | |
| SCHEMBL29625710 | 0.83 | EPHX1 (0.49) | EPHX1ALDH1A1GPR35POLBHTR2A | |
| SCHEMBL216321 | 0.83 | EPHX1 (0.49) | EPHX1ALDH1A1GPR35POLBHTR2A | |
| SCHEMBL28005687 | 0.83 | EPHX1 (0.52) | EPHX1ALDH1A1GPR35POLBHTR2A | |
| SCHEMBL6890191 | 0.83 | EPHX1 (0.45) | EPHX1ALDH1A1GPR35POLBHTR2A | |
| SCHEMBL4809140 | 0.83 | EPHX1 (0.51) | EPHX1ALDH1A1GPR35POLBHTR2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 254 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250171566-A1 | LIQUID, HYBRID UV/VIS RADIATION CURABLE RESIN COMPOSITIONS FOR ADDITIVE FABRICATION | STRATASYS INC (US) | 2025-05-29 | — | — | US | claimed |
| CN-116589622-A | High-temperature-resistant photoresist film-forming resin and preparation method and application thereof | 北京化工大学 | 2023-08-15 | — | — | CN | claimed |
| CN-114163564-B | Film-forming resin containing cholic acid-butenoate derivative and photoresist composition | 江苏集萃光敏电子材料研究所有限公司 | 2023-02-28 | — | — | CN | claimed |
| CN-114163564-A | Film-forming resin containing cholic acid-butenoate derivative and photoresist composition | 江苏集萃光敏电子材料研究所有限公司 | 2022-03-11 | — | — | CN | claimed |
| CN-113999340-A | Film-forming resin containing silicon or sulfur and photoresist composition | 江苏集萃光敏电子材料研究所有限公司 | 2022-02-01 | — | — | CN | claimed |
| CN-110256655-A | A kind of tannic acid Quito official's epoxy resin and preparation method thereof and preparation can liquid alkali developing negative photoresist | 苏州瑞红电子化学品有限公司 | 2019-09-20 | — | — | CN | claimed |
| CN-108084331-B | A kind of biology base film-forming resin and its photoresist of preparation | 江南大学 | 2019-08-16 | — | — | CN | claimed |
| US-6068962-A | NOVOLAK RESIN AS AN ALKALI-SOLUBLE COMPONENT; QUINONEDIAZIDE; ACID GENERATOR; ANTHRACENE DERIVATIVE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-05-30 | — | — | US | claimed |
| US-20250230272-A1 | MATERIALS FOR FREE-RADICAL ACTIVATION OF A LATENT CATALYST FOR RING-OPENING METATHESIS POLYMERIZATION (ROMP) AND USES THEREOF | Inkbit, LLC | 2025-07-17 | — | — | US | disclosed |
| EP-2868692-B2 | Stabilized matrix-filled liquid radiation curable resin compositions for additive fabrication | STRATASYS INC (US) | 2025-07-16 | — | — | EP | disclosed |
| US-20250171566-A1 | LIQUID, HYBRID UV/VIS RADIATION CURABLE RESIN COMPOSITIONS FOR ADDITIVE FABRICATION | STRATASYS INC (US) | 2025-05-29 | — | — | US | disclosed |
| US-12296528-B2 | Compositions and articles for additive fabrication and methods of using the same in particle image velocimetry testing | STRATASYS, INC. (US) | 2025-05-13 | — | — | US | disclosed |
| US-12269933-B2 | Stabilized matrix-filled liquid radiation curable resin compositions for additive fabrication | STRATASYS, INC. (US) | 2025-04-08 | — | — | US | disclosed |
| US-12252561-B2 | Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication | STRATASYS, INC. (US) | 2025-03-18 | — | — | US | disclosed |
| US-5558971-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| US-5558976-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR, PHOTORESISTS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| EP-0704762-A1 | Resist material and pattern formation | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1996-04-03 | — | — | EP | disclosed |
| EP-0636941-B1 | Deep ultraviolet absorbent and its use in pattern formation | WAKO PURE CHEM IND LTD (JP) | 1996-03-20 | — | — | EP | disclosed |
| EP-0675410-A1 | Resist composition for deep ultraviolet light | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1995-10-04 | — | — | EP | disclosed |
| EP-0636941-A1 | Deep ultraviolet absorbent and its use in pattern formation | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1995-02-01 | — | — | EP | disclosed |