Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 4/20 | 0.44 |
| ▸ | CA1 | P00915 | 4/20 | 0.44 |
| ▸ | CA2 | P00918 | 4/20 | 0.44 |
| ▸ | CA7 | P43166 | 4/20 | 0.44 |
| ▸ | CA9 | Q16790 | 4/20 | 0.44 |
| ▸ | CA14 | Q9ULX7 | 4/20 | 0.44 |
| ▸ | ELANE | P08246 | 1/20 | 0.41 |
| ▸ | THRB | P10828 | 1/20 | 0.39 |
| ▸ | ESR1 | P03372 | 6/20 | 0.36 |
| ▸ | ESR2 | Q92731 | 6/20 | 0.36 |
| ▸ | GRM6 | O15303 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.36 |
| ▸ | MEN1 | O00255 | 3/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.36 |
| ▸ | GAA | P10253 | 2/20 | 0.36 |
| ▸ | MAPT | P10636 | 2/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.36 |
| ▸ | JAK2 | O60674 | 1/20 | 0.36 |
| ▸ | USP2 | O75604 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7753553 | 0.85 | CA12 (0.59) | CA12CA1CA2CA7CA9 | |
| SCHEMBL8101855 | 0.82 | ELANE (0.47) | CA1CA2ELANEESR1ESR2 | |
| SCHEMBL22339912 | 0.80 | CA12 (0.51) | CA12CA1CA2CA7CA9 | |
| SCHEMBL7754211 | 0.78 | CA12 (0.43) | CA12CA1CA2CA7CA9 | |
| SCHEMBL7753163 | 0.77 | CA12 (0.42) | CA12CA1CA2CA7CA9 | |
| SCHEMBL7753167 | 0.77 | CA12 (0.42) | CA12CA1CA2CA7CA9 | |
| SCHEMBL2220768 | 0.77 | CA12 (0.50) | CA12CA1CA2CA7CA9 | |
| SCHEMBL4059205 | 0.76 | ELANE (0.49) | ELANEESR1ESR2KMT2AMEN1 | |
| SCHEMBL2221010 | 0.76 | ELANE (0.49) | CA12CA1CA2CA7CA9 | |
| SCHEMBL7913179 | 0.76 | ELANE (0.40) | CA12CA1CA2CA7CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20110177454-A1 | RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL | PANASONIC CORPORATION (JP) | 2011-07-21 | — | — | US | claimed |
| US-9778569-B2 | Positive photosensitive resin composition, method for producing film using same, and electronic component | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-10-03 | — | — | US | disclosed |
| US-20160266491-A1 | Positive Photosensitive Resin Composition, Method for Producing Film Using Same, and Electronic Component | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-09-15 | — | — | US | disclosed |
| US-20110177454-A1 | RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL | PANASONIC CORPORATION (JP) | 2011-07-21 | — | — | US | disclosed |