SCHEMBL22228554

SCHEMBL22228554

CC1CN(C)CCCN(C)CN(C)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22228555 0.90
SCHEMBL8242173 0.89 KDM4E (0.32)
SCHEMBL22228581 0.87 KDM4E (0.35)
SCHEMBL16203353 0.84 KDM4E (0.39)
SCHEMBL16232798 0.84 KDM4E (0.39)
SCHEMBL1898928 0.84
SCHEMBL22228578 0.81 ALDH1A1 (0.36)
SCHEMBL22228551 0.81
SCHEMBL12712288 0.81
SCHEMBL22228560 0.81

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220396595-A1 A METAL COMPLEX AND USE THEREOF RHODIA OPERATIONS (FR) 2022-12-15 US claimed
CN-114599772-A Metal complexes and their use 罗地亚经营管理公司 2022-06-07 CN claimed
US-20200231910-A1 BLEACH OR DETERGENT COMPOSITION RHODIA OPERATIONS (FR) 2020-07-23 US claimed
US-20220396595-A1 A METAL COMPLEX AND USE THEREOF RHODIA OPERATIONS (FR) 2022-12-15 US disclosed
CN-114599772-A Metal complexes and their use 罗地亚经营管理公司 2022-06-07 CN disclosed
US-20200231910-A1 BLEACH OR DETERGENT COMPOSITION RHODIA OPERATIONS (FR) 2020-07-23 US disclosed