SCHEMBL2223039

SCHEMBL2223039

C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7925570 1.00
SCHEMBL7936205 1.00
SCHEMBL7934409 1.00
SCHEMBL7934363 1.00
SCHEMBL621059 0.97 ALDH1A1 (0.31)
SCHEMBL11842735 0.87 ALDH1A1 (0.39)
SCHEMBL16000530 0.83
SCHEMBL7046165 0.83
SCHEMBL4233757 0.83
SCHEMBL21609279 0.83

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 88 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112881259-A Visualization device and method for measuring gas-water relative permeability of joint network based on steady state method 山东科技大学 2021-06-01 CN claimed
EP-3289039-A1 DURABLE ICEPHOBIC SURFACES The Regents of The University of Michigan (US) 2018-03-07 EP claimed
WO-2016176350-A1 DURABLE ICEPHOBIC SURFACES THE REGENTS OF THE UNIVERSITY OF MICHIGAN (US) 2016-11-03 WO claimed
CN-104353265-B Low-dosage environment-friendly seawater desalination engineering defoaming agent JIANGSU SAIOUXINYUE DEFOAMER CO.,LTD. (CN) 2016-03-09 CN claimed
CN-104353265-A Low-dosage and environment-friendly defoaming agent for seawater desalination engineering JIANGSU SAIOUXINYUE DEFOAMER CO LTD 2015-02-18 CN claimed
US-8237047-B2 Method of making a photovoltaic device or front substrate for use in same with scratch-resistant coating and resulting product GUARDIAN INDUSTRIES CORP. (US) 2012-08-07 US claimed
EP-2156474-A2 METHOD OF MAKING A PHOTOVOLTAIC DEVICE WITH SCRATCH-RESISTANT ANTIREFLECTIVE COATING AND RESULTING PRODUCT Guardian Industries Corp. (US) 2010-02-24 EP claimed
EP-2150984-A2 METHOD OF MAKING A PHOTOVOLTAIC DEVICE OR FRONT SUBSTRATE WITH BARRIER LAYER FOR USE IN SAME AND RESULTING PRODUCT Guardian Industries Corp. (US) 2010-02-10 EP claimed
WO-2008153617-A2 METHOD OF MAKING A PHOTOVOLTAIC DEVICE OR FRONT SUBSTRATE WITH BARRIER LAYER FOR USE IN SAME AND RESULTING PRODUCT GUARDIAN INDUSTRIES CORP. (US) 2008-12-18 WO claimed
US-20080295884-A1 Method of making a photovoltaic device or front substrate with barrier layer for use in same and resulting product GUARDIAN GLASS, LLC. 2008-12-04 US claimed
WO-2007040834-A2 PLURAL TREATMENT STEP PROCESS FOR TREATING DIELECTRIC FILMS TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2006135692-A2 PROCESSES FOR THE PREPARATION OF DOCETAXEL FLORIDA STATE UNIVERSITY RESEARCH FOUNDATION, INC. (US) 2006-12-21 WO claimed
WO-2006135656-A2 PROCESSES FOR THE PREPARATION OF PACLITAXEL FLORIDA STATE UNIVERSITY RESEARCH FOUNDATION, INC. (US) 2006-12-21 WO claimed
WO-2006135655-A2 PROCESSES FOR THE PRODUCTION OF POLYCYCLIC FUSED RING COMPOUNDS FLORIDA STATE UNIVERSITY RESEARCH FOUNDATION, INC. (US) 2006-12-21 WO claimed
WO-2006091264-A1 METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM TOKYO ELECTRON LIMITED (JP) 2006-08-31 WO claimed
US-6451116-B2 Apparatus for electroless plating a contact pad MICRON TECHNOLOGY, INC. 2002-09-17 US claimed
US-6346151-B1 Method and apparatus for electroless plating a contact pad MICRON TECHNOLOGY, INC. 2002-02-12 US claimed
US-20010052318-A1 Apparatus for electroless plating a contact pad MICRON SEMICONDUCTOR PRODUCTS, INC. 2001-12-20 US claimed
EP-0886807-A1 COLOR FILTER POLAROID CORPORATION (US) 1998-12-30 EP claimed
WO-1997034201-A1 COLOR FILTER POLAROID CORPORATION (US) 1997-09-18 WO claimed