SCHEMBL222489

SCHEMBL222489

CC(O)(CC(O)CO)C(=O)O

nearest known ligand 0.45

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TET2 Q6N021 1/20 0.45
ALDH1A1 P00352 2/20 0.39
TSHR P16473 2/20 0.39
LMNA P02545 3/20 0.36
ACACB O00763 1/20 0.36
ACACA Q13085 1/20 0.36
OR51E2 Q9H255 1/20 0.35
TP53 P04637 1/20 0.33
HMGCR P04035 1/20 0.33
CHRM1 P11229 1/20 0.33
TBXA2R P21731 1/20 0.33
ADRA1A P35348 1/20 0.33
CYP2D6 P10635 1/20 0.32
CYP2C19 P33261 1/20 0.32
HIF1A Q16665 1/20 0.32
CPT2 P23786 1/20 0.31
ACLY P53396 1/20 0.31
SLC22A6 Q4U2R8 1/20 0.31
THRB P10828 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14803936 0.82 TET2 (0.42) TET2ALDH1A1TSHRLMNAACACB
Palmitic Acid SCHEMBL28154189 0.81 FFAR4 (0.56) ALDH1A1TSHROR51E2SLC22A6
Stearic Acid SCHEMBL25292412 0.81 FFAR4 (0.56) ALDH1A1TSHROR51E2SLC22A6
SCHEMBL9346659 0.79 ALDH1A1 (0.35) TET2ALDH1A1LMNA
SCHEMBL7698392 0.78 ACACB (0.47) TET2ALDH1A1TSHRLMNAACACB
SCHEMBL5704287 0.78 TET2 (0.46) TET2ALDH1A1TSHRACACBACACA
Lactic Acid SCHEMBL38650676 0.77 TP53 (0.48) TET2ALDH1A1TSHRACACBACACA
SCHEMBL27931384 0.76 TET2 (0.45) TET2ALDH1A1TSHRACACBACACA
SCHEMBL9418945 0.76 TET2 (0.45) TET2ALDH1A1TSHRACACBACACA
SCHEMBL28052626 0.76 TET2 (0.45) TET2ALDH1A1TSHRACACBACACA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130273123-A1 Colloidal Carrier System with Penetration Properties for Encapsulating Lipophilic Active Agents and Oils for Topical Use BLUME GABRIELE (DE) 2013-10-17 US claimed
US-20230248720-A1 Long Acting Injectable Formulations ABON PHARMACEUTICALS, LLC 2023-08-10 US disclosed
US-11596628-B2 Long acting injectable formulations ABON PHARMACEUTICALS, LLC (US) 2023-03-07 US disclosed
CN-115484934-A Method for forming particles by continuous droplet formation and dewatering 伊勒卓菲公司 2022-12-16 CN disclosed
CN-114514035-A Compositions and methods for delivering therapeutic biologies for treatment of diseases 伊勒卓菲公司 2022-05-17 CN disclosed
EP-3772965-A1 PROCESS FOR THE FORMATION OF EMULSIFIERS AND PROCESSING AID FOR THE PREPARATION OF BAKERY PRODUCTS Il Granaio delle Idee Srl (IT) 2021-02-17 EP disclosed
WO-2019186248-A1 PROCESS FOR THE FORMATION OF EMULSIFIERS AND PROCESSING AID FOR THE PREPARATION OF BAKERY PRODUCTS IL GRANAIO DELLE IDEE SRL (IT) 2019-10-03 WO disclosed
EP-3400016-A1 LONG ACTING INJECTABLE FORMULATIONS Abon Pharmaceuticals, LLC (US) 2018-11-14 EP disclosed
US-20170196802-A1 Long Acting Injectable Formulations ABON PHARMACEUTICALS, LLC (US) 2017-07-13 US disclosed
US-20170196855-A1 Long Acting Injectable Formulations ABON PHARMACEUTICALS, LLC (US) 2017-07-13 US disclosed
WO-2017119928-A1 LONG ACTING INJECTABLE FORMULATIONS ABON PHARMACEUTICALS, LLC (US) 2017-07-13 WO disclosed
WO-2017119936-A1 LONG ACTING INJECTABLE FORMULATIONS ABON PHARMACEUTICALS, LLC (US) 2017-07-13 WO disclosed
CN-103391764-B organic compounds 奇华顿股份有限公司 2017-04-12 CN disclosed
US-8753801-B2 Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same FUJIFILM CORPORATION (JP) 2014-06-17 US disclosed
CN-103391764-A Organic compounds GIVAUDAN SA 2013-11-13 CN disclosed
US-20120003436-A1 PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL, AND PHOTOSENSITIVE FILM, PATTERN FORMING METHOD, PATTERN FILM, LOW REFRACTIVE INDEX FILM, OPTICAL DEVICE AND SOLID-STATE IMAGING DEVICE EACH USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-05 US disclosed
CN-100454143-C Positive resist composition TOKYO OHKA KOGYO CO LTD (JP) 2009-01-21 CN disclosed
CN-1677234-A Positive resist composition TOKYO OHKA KOGYO CO LTD (JP) 2005-10-05 CN disclosed