SCHEMBL2225324

SCHEMBL2225324

CCC(O)C(O)C(=O)OC

nearest known ligand 0.43

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.43
CA2 P00918 2/20 0.43
SMN1; SMN2 Q16637 2/20 0.39
ZDHHC7 Q9NXF8 1/20 0.36
ABCB1 P08183 1/20 0.35
MGAM O43451 1/20 0.35
GAA P10253 1/20 0.35
SI P14410 1/20 0.35
MGAM2 Q2M2H8 1/20 0.35
CA14 Q9ULX7 2/20 0.33
MIF P14174 1/20 0.33
CA12 O43570 2/20 0.32
MMP1 P03956 1/20 0.32
MMP2 P08253 1/20 0.32
MMP8 P22894 1/20 0.32
CA9 Q16790 1/20 0.32
TSHR P16473 2/20 0.32
ALDH1A1 P00352 1/20 0.32
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12518959 1.00 CA1 (0.43) CA1CA2SMN1; SMN2ZDHHC7ABCB1
SCHEMBL12517985 1.00 CA1 (0.43) CA1CA2SMN1; SMN2ZDHHC7ABCB1
SCHEMBL3409711 0.81 CA1 (0.41) CA1CA2SMN1; SMN2ZDHHC7ABCB1
SCHEMBL12519182 0.81 CA1 (0.45) CA1CA2SMN1; SMN2ZDHHC7ABCB1
SCHEMBL12517987 0.81 CA1 (0.45) CA1CA2SMN1; SMN2ZDHHC7ABCB1
SCHEMBL31324780 0.80 PDE4A (0.39) CA1CA2SMN1; SMN2ZDHHC7CA14
SCHEMBL17040285 0.80 ALDH1A1 (0.43) MGAMGAASIMGAM2ALDH1A1
SCHEMBL29403514 0.80 PDE4A (0.39) CA1CA2SMN1; SMN2ZDHHC7CA14
SCHEMBL16488722 0.80 ALDH1A1 (0.43) MGAMGAASIMGAM2ALDH1A1
SCHEMBL9626918 0.80 PDE4A (0.39) CA1CA2SMN1; SMN2ZDHHC7CA14

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114846003-A Deuterated compounds for the treatment of cancer 阿提奥斯医药有限公司 2022-08-02 CN disclosed
US-11370872-B2 Composition for pattern formation, and pattern-forming method JSR CORPORATION (JP) 2022-06-28 US disclosed
US-20190135967-A1 COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD JSR CORPORATION (JP) 2019-05-09 US disclosed
WO-2011087995-A2 ORGANIC COMPOUNDS BARRY CLIFTON (US) 2011-07-21 WO disclosed