SCHEMBL22277477

SCHEMBL22277477

CCC(COC(=O)c1cc(I)cc(I)c1I)(COC(=O)c1cc(I)cc(I)c1I)C(=O)OC(C)(C)C1CCNCC1

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
PLAT P00750 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22277833 0.91 PLAT (0.32) PLAT
SCHEMBL22277838 0.90 PLAT (0.35) PLAT
SCHEMBL22277441 0.84 POLB (0.30)
SCHEMBL22277449 0.83 PLAT (0.31) PLAT
SCHEMBL22277798 0.82 HDAC3 (0.31) PLAT
SCHEMBL22277836 0.82 SLC6A2 (0.31) PLAT
SCHEMBL26426834 0.81 PLAT (0.35) PLAT
SCHEMBL22277442 0.80 PLAT (0.33) PLAT
SCHEMBL26426767 0.80 PLAT (0.30) PLAT
SCHEMBL26426804 0.79 HDAC3 (0.36) PLAT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20200241417-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-07-30 US disclosed