SCHEMBL26426767

SCHEMBL26426767

CCC(C)(OC(=O)c1cc(I)cc(I)c1I)C1CCNCC1

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
PLAT P00750 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26426769 0.87 POLB (0.31)
SCHEMBL22277441 0.85 POLB (0.30)
SCHEMBL22277827 0.82
SCHEMBL22277448 0.81
SCHEMBL22277477 0.80 PLAT (0.33) PLAT
SCHEMBL22277449 0.79 PLAT (0.31) PLAT
SCHEMBL22277836 0.77 SLC6A2 (0.31) PLAT
SCHEMBL22277798 0.77 HDAC3 (0.31) PLAT
SCHEMBL22277838 0.77 PLAT (0.35) PLAT
SCHEMBL22277446 0.75 POLB (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed