SCHEMBL22287256

SCHEMBL22287256

CCN(CC)N[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24594846 0.62
SCHEMBL28763065 0.62
SCHEMBL1792330 0.60
SCHEMBL81587 0.60
SCHEMBL3236325 0.60
SCHEMBL9966620 0.60
SCHEMBL9564042 0.57
SCHEMBL8369828 0.57
Hydrochloric Acid SCHEMBL9003263 0.57
Water SCHEMBL11566326 0.57

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11649547-B2 Deposition of carbon doped silicon oxide VERSUM MATERIALS US, LLC (US) 2023-05-16 US disclosed
CN-114867888-A Method for depositing a film 弗萨姆材料美国有限责任公司 2022-08-05 CN disclosed
CN-114365265-A Compositions for non-conformal deposition of silicon-containing films and methods of using the same 弗萨姆材料美国有限责任公司 2022-04-15 CN disclosed
EP-3902939-A1 DEPOSITION OF CARBON DOPED SILICON OXIDE Versum Materials US, LLC (US) 2021-11-03 EP disclosed
CN-113383108-A Deposition of carbon-doped silicon oxide 弗萨姆材料美国有限责任公司 2021-09-10 CN disclosed
WO-2020163359-A1 DEPOSITION OF CARBON DOPED SILICON OXIDE VERSUM MATERIALS US, LLC (US) 2020-08-13 WO disclosed
US-20200248309-A1 Deposition Of Carbon Doped Silicon Oxide VERSUM MATERIALS US, LLC (US) 2020-08-06 US disclosed