⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15292129 | 0.75 | — | — | |
| SCHEMBL12935857 | 0.75 | — | — | |
| SCHEMBL28763065 | 0.70 | — | — | |
| SCHEMBL438823 | 0.70 | — | — | |
| SCHEMBL22655243 | 0.65 | — | — | |
| SCHEMBL9564042 | 0.64 | — | — | |
| SCHEMBL22287256 | 0.60 | — | — | |
| SCHEMBL14372070 | 0.60 | — | — | |
| SCHEMBL25416793 | 0.58 | — | — | |
| SCHEMBL22589125 | 0.54 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11482533-B2 | Apparatus and methods for plug fill deposition in 3-D NAND applications | ASM IP HOLDING B.V. (NL) | 2022-10-25 | — | — | US | claimed |
| CN-111599815-A | Apparatus and method for depositing plug fill in 3-D NAND applications | ASM IP私人控股有限公司 | 2020-08-28 | — | — | CN | claimed |
| US-20200266208-A1 | APPARATUS AND METHODS FOR PLUG FILL DEPOSITION IN 3-D NAND APPLICATIONS | ASM IP HOLDING B.V. (NL) | 2020-08-20 | — | — | US | claimed |
| EP-4747262-A1 | SILICON PRECURSOR COMPOUND, METHOD FOR PREPARING THE SAME, AND METHOD FOR PREPARING A SILICON-CONTAINING THIN FILM | Merck Patent GmbH (DE) | 2026-05-27 | — | — | EP | disclosed |
| WO-2025017523-A1 | SILICON PRECURSOR COMPOUND, METHOD FOR PREPARING THE SAME, AND METHOD FOR PREPARING A SILICON-CONTAINING THIN FILM | MERCK PATENT GMBH (DE) | 2025-01-23 | — | — | WO | disclosed |
| US-11482533-B2 | Apparatus and methods for plug fill deposition in 3-D NAND applications | ASM IP HOLDING B.V. (NL) | 2022-10-25 | — | — | US | disclosed |
| US-11049714-B2 | Silyl substituted organoamines as precursors for high growth rate silicon-containing films | VERSUM MATERIALS US, LLC (US) | 2021-06-29 | — | — | US | disclosed |
| CN-111599815-A | Apparatus and method for depositing plug fill in 3-D NAND applications | ASM IP私人控股有限公司 | 2020-08-28 | — | — | CN | disclosed |
| US-20200266208-A1 | APPARATUS AND METHODS FOR PLUG FILL DEPOSITION IN 3-D NAND APPLICATIONS | ASM IP HOLDING B.V. (NL) | 2020-08-20 | — | — | US | disclosed |
| US-20190088474-A1 | Silyl Substituted Organoamines as Precursors for High Growth Rate Silicon-Containing Films | VERSUM MATERIALS US, LLC (US) | 2019-03-21 | — | — | US | disclosed |
| US-8541318-B2 | Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2013-09-24 | — | — | US | disclosed |
| US-8242032-B2 | Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2012-08-14 | — | — | US | disclosed |
| US-20120156894-A1 | MONOSILANE OR DISILANE DERIVATIVES AND METHOD FOR LOW TEMPERATURE DEPOSITION OF SILICON-CONTAINING FILMS USING THE SAME | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2012-06-21 | — | — | US | disclosed |
| US-20110165762-A1 | MONOSILANE OR DISILANE DERIVATIVES AND METHOD FOR LOW TEMPERATURE DEPOSITION OF SILICON-CONTAINING FILMS USING THE SAME | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2011-07-07 | — | — | US | disclosed |
| US-7863203-B2 | Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2011-01-04 | — | — | US | disclosed |
| US-20080160174-A1 | MONOSILANE OR DISILANE DERIVATIVES AND METHOD FOR LOW TEMPERATURE DEPOSITION OF SILICON-CONTAINING FILMS USING THE SAME | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2008-07-03 | — | — | US | disclosed |