⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22287383 | 0.72 | CA1 (0.30) | — | |
| SCHEMBL17691362 | 0.69 | — | — | |
| SCHEMBL22287333 | 0.67 | DNM1 (0.33) | — | |
| SCHEMBL17691361 | 0.67 | — | — | |
| SCHEMBL15309831 | 0.64 | — | — | |
| SCHEMBL22287331 | 0.62 | CYP1A2 (0.31) | — | |
| SCHEMBL15309959 | 0.61 | — | — | |
| SCHEMBL22287346 | 0.61 | — | — | |
| SCHEMBL22287332 | 0.61 | — | — | |
| SCHEMBL17691302 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025226985-A1 | PASSIVATION OF POLYSILICON MATERIAL AND SELECTIVE DEPOSITION OF DIELECTRIC MATERIAL UTILIZING ALKYNES | VERSUM MATERIALS US, LLC (US) | 2025-10-30 | — | — | WO | claimed |
| WO-2025076009-A1 | SELECTIVE DEPOSITION OF SILICON CONTAINING FILMS UTILIZING ORGANOAMINOPOLYSILOXANES AND ORGANOAMINOPOLYSILAZANES | VERSUM MATERIALS US, LLC (US) | 2025-04-10 | — | — | WO | claimed |
| US-20230183272-A1 | COMPOSITIONS AND METHODS USING SAME FOR SILICON CONTAINING FILMS | VERSUM MAT US LLC (US) | 2023-06-15 | — | — | US | claimed |
| US-20200247830-A1 | Compositions And Methods Using Same for Silicon Containing Films | VERSUM MATERIALS US, LLC (US) | 2020-08-06 | — | — | US | claimed |
| US-20260130139-A1 | LOW TEMPERATURE SI-CONTAINING FILMS DEPOSITED FROM CHLOROSILANE AND AMINOSILANE REACTIONS | VERSUM MAT US LLC (US) | 2026-05-07 | — | — | US | disclosed |
| WO-2025080587-A2 | SILICON-CONTAINING FILMS HAVING SURFACES MODIFIED FROM HALOGENATED SILICON-CONTAINING COMPOUNDS | VERSUM MATERIALS US, LLC (US) | 2025-04-17 | — | — | WO | disclosed |
| WO-2025076009-A1 | SELECTIVE DEPOSITION OF SILICON CONTAINING FILMS UTILIZING ORGANOAMINOPOLYSILOXANES AND ORGANOAMINOPOLYSILAZANES | VERSUM MATERIALS US, LLC (US) | 2025-04-10 | — | — | WO | disclosed |
| WO-2024081357-A1 | LOW TEMPERATURE SI-CONTAINING FILMS DEPOSITED FROM CHLOROSILANE AND AMINOSILANE REACTIONS | VERSUM MATERIALS US, LLC (US) | 2024-04-18 | — | — | WO | disclosed |
| US-20230183272-A1 | COMPOSITIONS AND METHODS USING SAME FOR SILICON CONTAINING FILMS | VERSUM MAT US LLC (US) | 2023-06-15 | — | — | US | disclosed |
| US-20230183272-A1 | COMPOSITIONS AND METHODS USING SAME FOR SILICON CONTAINING FILMS | VERSUM MAT US LLC (US) | 2023-06-15 | — | — | US | disclosed |
| US-20200247830-A1 | Compositions And Methods Using Same for Silicon Containing Films | VERSUM MATERIALS US, LLC (US) | 2020-08-06 | — | — | US | disclosed |