Hydrochloric Acid

Hydrochloric Acid

SCHEMBL2229190

C[n+]1ccn(CCCC#N)c1.[Cl-]

nearest known ligand 0.59

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.54
MEN1 O00255 1/20 0.54
APAF1 O14727 1/20 0.54
NPC1 O15118 1/20 0.54
PLA2G1B P04054 1/20 0.54
HSP90AA1 P07900 1/20 0.54
MAPT P10636 1/20 0.54
MAPK1 P28482 1/20 0.54
HTT P42858 1/20 0.54
RAB9A P51151 1/20 0.54
KMT2A Q03164 1/20 0.54
NPSR1 Q6W5P4 1/20 0.54
ATG4B Q9Y4P1 1/20 0.54
CA12 O43570 1/20 0.37
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
CA9 Q16790 1/20 0.37
FDPS P14324 2/20 0.36
PON1 P27169 1/20 0.33
LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL372789 0.98 SMN1; SMN2 (0.56) SMN1; SMN2MEN1APAF1NPC1PLA2G1B
Bromide SCHEMBL26596998 0.96 SMN1; SMN2 (0.59) SMN1; SMN2MEN1APAF1NPC1PLA2G1B
Cyanamide SCHEMBL1340736 0.93 SMN1; SMN2 (0.51) SMN1; SMN2MEN1APAF1NPC1PLA2G1B
SCHEMBL18507044 0.93 SMN1; SMN2 (0.59) SMN1; SMN2MEN1APAF1NPC1PLA2G1B
SCHEMBL4252320 0.92 SMN1; SMN2 (0.50) SMN1; SMN2MEN1APAF1NPC1PLA2G1B
SCHEMBL1340737 0.90 MEN1 (0.49) SMN1; SMN2MEN1APAF1NPC1PLA2G1B
SCHEMBL29624315 0.90 MEN1 (0.49) SMN1; SMN2MEN1APAF1NPC1PLA2G1B
Bromide SCHEMBL9547363 0.90 SMN1; SMN2 (0.65) SMN1; SMN2MEN1APAF1NPC1PLA2G1B
SCHEMBL372622 0.87 SMN1; SMN2 (0.50) SMN1; SMN2MEN1APAF1NPC1PLA2G1B
Water SCHEMBL28178852 0.85 SMN1; SMN2 (0.49) SMN1; SMN2MEN1APAF1NPC1PLA2G1B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 133 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3275039-B1 ELECTROLYTES AND METAL HYDRIDE BATTERIES BASF CORP (US) 2025-08-27 EP claimed
CN-119823109-A An electrochromic material electrochromic composition and electrochromic device 吉林大学 2025-04-15 CN claimed
CN-111117594-B Electrochromic material and electrochromic device based on dynamic metal-ligand complexation 吉林大学 2024-03-26 CN claimed
US-11567385-B2 Electrochromic device THE BOEING COMPANY (US) 2023-01-31 US claimed
EP-3753973-B1 A METHOD FOR SEALING A GAP BETWEEN ADJOINING OR CONNECTED SOLID SURFACES ON AN AIRCRAFT BOEING CO (US) 2022-09-28 EP claimed
CN-115010836-A Electrochromatic polymer, nano particles and device 吉林大学 2022-09-06 CN claimed
US-20220171247-A1 ELECTROCHROMIC DEVICE THE BOEING COMPANY 2022-06-02 US claimed
CN-109280186-B Method and composition for curing the surface of uncured polysulfide rubber 波音公司 2022-05-10 CN claimed
US-11307476-B2 Electrochromic device THE BOEING COMPANY (US) 2022-04-19 US claimed
US-11292853-B2 Methods and compositions for curing a surface of an uncured polysulfide rubber THE BOEING COMPANY (US) 2022-04-05 US claimed
US-20160141726-A1 Electrolytes and Metal Hydride Batteries BASF CORPORATION 2016-05-19 US claimed
US-20160141727-A1 Electrolytes and Metal Hydride Batteries BASF CORPORATION 2016-05-19 US claimed
EP-2797935-B1 SYNTHESIS OF ORGANOHALOSILANE MONOMERS VIA ENHANCED CLEAVAGE OF DIRECT PROCESS RESIDUE MOMENTIVE PERFORMANCE MAT INC (US) 2016-03-09 EP claimed
EP-2797936-B1 SYNTHESIS OF ORGANOHALOSILANE MONOMERS FROM CONVENTIONALLY UNCLEAVABLE DIRECT PROCESS RESIDUE MOMENTIVE PERFORMANCE MAT INC (US) 2016-03-09 EP claimed
US-20140335698-A1 COMPONENT OF A PLASMA PROCESSING APPARATUS HAVING A PROTECTIVE IN SITU FORMED LAYER ON A PLASMA EXPOSED SURFACE LAM RESEARCH CORPORATION (US) 2014-11-13 US claimed
CN-104143494-A Component of a plasma processing apparatus having a protective in situ formed layer on a plasma exposed surface LAM RES CORP 2014-11-12 CN claimed
US-8697901-B2 Synthesis of organohalosilane monomers via enhanced cleavage of direct process residue MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2014-04-15 US claimed
US-8637695-B2 Synthesis of organohalosilane monomers from conventionally uncleavable Direct Process Residue MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2014-01-28 US claimed
US-20130172593-A1 Synthesis of Organohalosilane Monomers From Conventionally Uncleavable Direct Process Residue MOMENTIVE PERFORMANCE MATERIALS INC. 2013-07-04 US claimed
US-20130172594-A1 Synthesis of Organohalosilane Monomers Via Enhanced Cleavage of Direct Process Residue MOMENTIVE PERFORMANCE MATERIALS INC. 2013-07-04 US claimed