SCHEMBL22300

SCHEMBL22300

CCC(C)(O)C(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13354747 1.00
SCHEMBL13312865 1.00
SCHEMBL27471686 0.97
SCHEMBL28096235 0.97
SCHEMBL30132067 0.97
SCHEMBL5052379 0.91 ALDH1A1 (0.33)
SCHEMBL11386315 0.89 TSHR (0.38)
SCHEMBL29172867 0.79 TSHR (0.31)
SCHEMBL825422 0.78
SCHEMBL5872623 0.76 ALDH1A1 (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1233 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118899439-A Negative electrode slurry, preparation method thereof, lithium ion battery negative electrode and lithium ion battery 中国石油化工股份有限公司 2024-11-05 CN claimed
CN-118894764-A Dispersing agent, preparation method and application thereof, and nano silicon particle dispersion liquid 中国石油化工股份有限公司 2024-11-05 CN claimed
US-20220179312-A1 PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2022-06-09 US claimed
CN-111574515-A Preparation method and purification method of organic fluorinated aliphatic compound 财团法人峨山社会福祉财团 2020-08-25 CN claimed
US-20200110339-A1 PHOTORESIST PATTERN SHRINKING COMPOSITION AND PATTERN SHRINKING METHOD YCCHEM CO., LTD. (KR) 2020-04-09 US claimed
EP-1824805-B1 METHOD FOR PREPARATION OF ORGANOFLUORO COMPOUNDS IN ALCOHOL SOLVENTS FUTURECHEM CO LTD (KR) 2020-02-12 EP claimed
US-10392344-B2 Method for preparing fluorine-18 eluent with adjusted PH, and method for labelling fluorine-18 using same THE ASAN FOUNDATION (KR) 2019-08-27 US claimed
US-20190137880-A1 METHOD AND COMPOSITION FOR IMPROVING LWR IN PATTERNING STEP USING NEGATIVE TONE PHOTORESIST YOUNG CHANG CHEMICAL CO., LTD (KR) 2019-05-09 US claimed
CN-109313401-A Photoresist pattern reducing composition and pattern reducing method 荣昌化学制品株式会社 2019-02-05 CN claimed
CN-108475022-A LWR ameliorative ways and composition in the Patternized technique using negative photoresist 荣昌化学制品株式会社 2018-08-31 CN claimed
EP-1577935-A2 Compositions for preparing low dielectric materials containing solvents AIR PRODUCTS AND CHEMICALS, INC. (US) 2005-09-21 EP claimed
US-20050196974-A1 Compositions for preparing low dielectric materials containing solvents VERSUM MATERIALS US, LLC 2005-09-08 US claimed
EP-0927227-B1 THERMOPLASTIC MOULDING COMPOSITIONS BASF AG (DE) 2002-01-02 EP claimed
US-6162867-A Thermoplastic moulding compounds BASF AKTIENGESELLSCHAFT (DE) 2000-12-19 US claimed
CN-1237992-A thermoplastic molding composition BASF AG (DE) 1999-12-08 CN claimed
EP-0859803-B1 THERMOPLASTIC MOULDING COMPOUND BASF AG (DE) 1999-12-01 EP claimed
US-5739250-A ONE STEP COPOLYMERIZATION WITHOUT ISOLATING THE INTERMEDIATE PREPOLYMER, CHAIN EXTENSION TO ELIMINATE VOLATILE MATERIAL BAYER AKTIENGESELLSCHAFT (DE) 1998-04-14 US claimed
US-5663265-A FREE RADICAL COPOLYMERIZATION FOR COATINGS HOECHST AKTIENGESELLSCHAFT (DE) 1997-09-02 US claimed
US-5596057-A INTERPOLYMER FROM STERICALLY HINDERED UNSATURATED ESTERS HOECHST AKTIENGESELLSCHAFT (DE) 1997-01-21 US claimed
US-4162271-A CATALYST SELECTIVITY THE GOODYEAR TIRE & RUBBER COMPANY (US) 1979-07-24 US claimed