⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20342019 | 1.00 | — | — | |
| SCHEMBL25694327 | 1.00 | — | — | |
| SCHEMBL16589212 | 1.00 | — | — | |
| SCHEMBL18476388 | 0.91 | — | — | |
| SCHEMBL21504660 | 0.90 | — | — | |
| SCHEMBL18470630 | 0.89 | — | — | |
| SCHEMBL21251519 | 0.87 | — | — | |
| SCHEMBL18354627 | 0.87 | — | — | |
| SCHEMBL23519224 | 0.86 | — | — | |
| SCHEMBL25788575 | 0.86 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11567406-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-01-31 | — | — | US | disclosed |
| US-20210003917-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-01-07 | — | — | US | disclosed |
| US-20200249571-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-08-06 | — | — | US | disclosed |