⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22306964 | 0.87 | — | — | |
| SCHEMBL20342019 | 0.87 | — | — | |
| SCHEMBL25694327 | 0.87 | — | — | |
| SCHEMBL16589212 | 0.87 | — | — | |
| SCHEMBL25694322 | 0.83 | — | — | |
| SCHEMBL13496180 | 0.80 | HMGCR (0.35) | — | |
| SCHEMBL24861755 | 0.79 | OPRK1 (0.34) | — | |
| SCHEMBL14219797 | 0.79 | OPRK1 (0.34) | — | |
| SCHEMBL13648552 | 0.79 | OPRK1 (0.34) | — | |
| SCHEMBL24361500 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3343292-B1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2020-05-06 | — | — | EP | disclosed |
| EP-3343291-B1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2019-08-14 | — | — | EP | disclosed |