SCHEMBL2231136

SCHEMBL2231136

O=S(=O)(NS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)F

nearest known ligand 0.50

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
CA2 P00918 20/20 0.50
CA1 P00915 19/20 0.50
MMP1 P03956 5/20 0.50
MMP2 P08253 5/20 0.50
MMP9 P14780 5/20 0.50
MMP8 P22894 5/20 0.50
MMP13 P45452 5/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2230420 0.97 CA2 (0.48) CA2CA1MMP1MMP2MMP9
SCHEMBL2230869 0.97 CA2 (0.48) CA2CA1MMP1MMP2MMP9
SCHEMBL2232021 0.97 CA2 (0.48) CA2CA1MMP1MMP2MMP9
SCHEMBL548088 0.95 CA2 (0.54) CA2CA1MMP1MMP2MMP9
SCHEMBL3433952 0.92 CA2 (0.48) CA2CA1MMP1MMP2MMP9
SCHEMBL3434755 0.92 CA2 (0.60) CA2CA1MMP1MMP2MMP9
SCHEMBL2231262 0.90 CA2 (0.46) CA2CA1MMP1MMP2MMP9
SCHEMBL2233445 0.90 CA2 (0.46) CA2CA1MMP1MMP2MMP9
SCHEMBL2232023 0.90 CA2 (0.46) CA2CA1MMP1MMP2MMP9
SCHEMBL2513548 0.90 CA2 (0.58) CA2CA1MMP1MMP2MMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2578567-B1 PROCESS FOR PREPARATION OF FLUORINE-CONTAINING IMIDE COMPOUNDS MITSUBISHI MATERIALS CORP (JP) 2016-01-13 EP disclosed
US-8936674-B2 Conductive silica sol composition, and molded article produced using the same MITSUBISHI MATERIALS CORPORATION (JP) 2015-01-20 US disclosed
US-8759578-B2 Method for manufacturing fluorine-containing imide compound MITSUBISHI MATERIALS CORPORATION (JP) 2014-06-24 US disclosed
US-20130137899-A1 PROCESS FOR PRODUCING FLUORINE-CONTAINING SULFONYLIMIDE COMPOUND MITSUBISHI MATERIALS ELECTRONIC CHEMICALS CO., LTD (JP) 2013-05-30 US disclosed
US-20130102506-A1 LUBRICANT BASE OIL AND LUBRICANT COMPOSITION IDEMITSU KOSAN CO., LTD. (JP) 2013-04-25 US disclosed
EP-2578567-A1 PROCESS FOR PREPARATION OF FLUORINE-CONTAINING IMIDE COMPOUNDS Mitsubishi Materials Corporation (JP) 2013-04-10 EP disclosed
US-20130066110-A1 METHOD FOR MANUFACTURING FLUORINE-CONTAINING IMIDE COMPOUND MITSUBISHI MATERIALS CORPORATION (JP) 2013-03-14 US disclosed
US-20120094235-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-04-19 US disclosed
US-20110210295-A1 Conductive silica sol composition, and molded article produced using the same MITSUBISHI MATERIALS CORPORATION (JP) 2011-09-01 US disclosed
EP-2354206-A1 ELECTRICALLY CONDUCTIVE SILICA SOL COMPOSITION AND MOLDED ARTICLE PRODUCED BY USING SAME Mitsubishi Materials Corporation (JP) 2011-08-10 EP disclosed
US-20080081292-A1 RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-04-03 US disclosed