⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12650465 | 1.00 | — | — | |
| SCHEMBL924825 | 1.00 | — | — | |
| Propylene Glycol SCHEMBL28789008 | 0.92 | TDP1 (0.53) | — | |
| Ether SCHEMBL374393 | 0.92 | LMNA (0.41) | — | |
| Ether SCHEMBL7042765 | 0.92 | LMNA (0.41) | — | |
| SCHEMBL3904266 | 0.89 | LMNA (0.39) | — | |
| SCHEMBL11138291 | 0.89 | LMNA (0.39) | — | |
| SCHEMBL16422 | 0.89 | LMNA (0.39) | — | |
| SCHEMBL548995 | 0.89 | LMNA (0.39) | — | |
| SCHEMBL9450423 | 0.89 | LMNA (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1686 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025064522-A1 | ETCHING COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-03-27 | — | — | WO | claimed |
| US-20250101303-A1 | ETCHING COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2025-03-27 | — | — | US | claimed |
| CN-116874659-B | Low-temperature secondary photo-curing grafting oligomer and photosensitive resin composition containing same | 深圳市安云鑫新材料科技有限公司 | 2025-01-28 | — | — | CN | claimed |
| WO-2024190309-A1 | PHOTOSENSITIVE COMPOSITION, CURED PRODUCT, DISPLAY DEVICE, AND PRODUCTION METHOD FOR CURED PRODUCT | 東レ株式会社 | 2024-09-19 | — | — | WO | claimed |
| WO-2024190310-A1 | PHOTOSENSITIVE COMPOSITION, CURED PRODUCT, DISPLAY DEVICE, AND METHOD FOR PRODUCING CURED PRODUCT | 東レ株式会社 | 2024-09-19 | — | — | WO | claimed |
| EP-3672944-B1 | CLEANING COMPOSITIONS | FUJIFILM ELECTRONIC MAT USA INC (US) | 2024-08-07 | — | — | EP | claimed |
| US-11955341-B2 | Etching solution and method for selectively removing silicon nitride during manufacture of a semiconductor device | VERSUM MATERIALS US, LLC (US) | 2024-04-09 | — | — | US | claimed |
| CN-108787177-B | Method and system for preparing xanthate by slurry method | 中南大学 | 2024-03-15 | — | — | CN | claimed |
| US-20240019781-A1 | DISPERSION RESIN, PREPARATION METHOD THEREFOR AND PHOTORESIST COMPOSITION | Shenzhen Brthrborder Semiconductor Materials Co., Ltd. (CN) | 2024-01-18 | — | — | US | claimed |
| WO-2023245625-A1 | DISPERSION RESIN, METHOD FOR PREPARING SAME, AND PHOTORESIST COMPOSITION | 深圳市邦得凌半导体材料有限公司 | 2023-12-28 | — | — | WO | claimed |
| WO-1994025993-A1 | METHOD OF IMPRINTING CATALYTICALLY ACTIVE PARTICLES ON MEMBRANE | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1994-11-10 | — | — | WO | claimed |
| EP-0622861-A1 | Membrane and electrode structure | E.I. DU PONT DE NEMOURS & COMPANY INCORPORATED (US) | 1994-11-02 | — | — | EP | claimed |
| US-5330860-A | Fuel cells | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1994-07-19 | — | — | US | claimed |
| US-5310765-A | Ether or epoxy alcohol | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1994-05-10 | — | — | US | claimed |
| EP-0524520-A2 | Liquid dyestuff preparations | BAYER AG (DE) | 1993-01-27 | — | — | EP | claimed |
| EP-0188568-B1 | METHOD OF DEVELOPING RADIATION SENSITIVE NEGATIVE RESISTS | Hughes Aircraft Company (US) | 1991-04-10 | — | — | EP | claimed |
| EP-0244917-A1 | Organic solvent soluble polyvalent metal alkoxy alkoxides | AKZO N.V. (NL) | 1987-11-11 | — | — | EP | claimed |
| US-4665009-A | HIGH QUALITY IMAGES | HUGHES AIRCRAFT COMPANY (US) | 1987-05-12 | — | — | US | claimed |
| EP-0188568-A1 | METHOD OF DEVELOPING RADIATION SENSITIVE NEGATIVE RESISTS. | HUGHES AIRCRAFT CO (US) | 1986-07-30 | — | — | EP | claimed |
| WO-1986000725-A1 | METHOD OF DEVELOPING RADIATION SENSITIVE NEGATIVE RESISTS | HUGHES AIRCRAFT COMPANY (US) | 1986-01-30 | — | — | WO | claimed |