SCHEMBL2234310

SCHEMBL2234310

CCO[SiH](CC(F)(F)C(C)F)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL525389 0.77
SCHEMBL8754976 0.74
SCHEMBL8332544 0.74
SCHEMBL2207301 0.74
SCHEMBL20481941 0.68
SCHEMBL6401469 0.67
SCHEMBL1955724 0.67
SCHEMBL302687 0.66 TSHR (0.32)
SCHEMBL3655426 0.66 TSHR (0.32)
SCHEMBL28537857 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 93 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114959938-A Polyester filament yarn and preparation method thereof 上海臻蕊纺织科技有限公司 2022-08-30 CN claimed
CN-114059194-A Method for directly preparing hydrophobic nanofibers on PCB 大连工业大学 2022-02-18 CN claimed
CN-109056385-B Deepening agent composition and preparation method thereof 清远市宏图助剂有限公司 2021-06-01 CN claimed
CN-112127156-B Environment-friendly fluorine-containing waterproof agent and preparation method thereof 珠海华大浩宏新材料有限公司 2021-04-20 CN claimed
CN-112127156-A Environment-friendly fluorine-containing waterproof agent and preparation method thereof 珠海华大浩宏新材料有限公司 2020-12-25 CN claimed
CN-108587186-B Modified white carbon black for reinforcing fluorosilicone rubber, preparation method thereof and fluorosilicone rubber 中国科学院化学研究所 2020-09-11 CN claimed
CN-116218164-B Packaging belt convenient to print and preparation method thereof 东莞市腾和新材料科技有限公司 2025-02-11 CN disclosed
WO-2025022873-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND FINGERPRINT AUTHENTICATION DEVICE USING SAID CURED FILM 東レ株式会社 2025-01-30 WO disclosed
US-20240384065-A1 SILOXANE RESIN COMPOSITION FOR FORMING CURED FILM, CURED FILM, AND METHOD OF PRODUCING POLYSILOXANE TORAY INDUSTRIES, INC. (JP) 2024-11-21 US disclosed
WO-2024185458-A1 RESIN COMPOSITION, CURED FILM, METHOD FOR PRODUCING SUBSTRATE WITH PATTERN OF CURED FILM, OPTICAL ELEMENT, AND METHOD FOR PRODUCING POLYSILOXANE 東レ株式会社 2024-09-12 WO disclosed
EP-3410468-B1 N-TYPE SEMICONDUCTOR ELEMENT, COMPLEMENTARY TYPE SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME, AND WIRELESS COMMUNICATION DEVICE IN WHICH THE SAME IS USED TORAY INDUSTRIES (JP) 2024-07-10 EP disclosed
US-11789363-B2 Positive photosensitive resin composition, cured film therefrom, and solid state image sensor comprising the same TORAY INDUSTRIES, INC. (JP) 2023-10-17 US disclosed
EP-3382751-B1 FERROELECTRIC MEMORY ELEMENT, METHOD FOR PRODUCING SAME, MEMORY CELL USING FERROELECTRIC MEMORY ELEMENT, AND RADIO COMMUNICATION DEVICE USING FERROELECTRIC MEMORY ELEMENT TORAY INDUSTRIES (JP) 2023-09-13 EP disclosed
EP-2239301-A1 SILOXANE RESIN COMPOSITIONS Toray Industries, Inc. (JP) 2010-10-13 EP disclosed
US-20090105360-A1 SILOXANE RESIN COMPOSITION AND PRODUCTION METHOD THEREOF TORAY INDUSTRIES, INC. (JP) 2009-04-23 US disclosed
EP-1942150-A1 SILOXANE RESIN COMPOSITION AND METHOD FOR PRODUCING SAME TORAY INDUSTRIES, INC. (JP) 2008-07-09 EP disclosed
US-20070266896-A1 Siloxane-Based Coating Material, Optical Article, and Production Method of Siloxane-Based Coating Material TORAY INDUSTRIES, INC. (JP) 2007-11-22 US disclosed
EP-1760126-A1 SILOXANE COATING MATERIAL, OPTICAL ARTICLES AND PROCESS FOR THE PRODUCTION OF SILOXANE COATING MATERIALS TORAY INDUSTRIES, INC. (JP) 2007-03-07 EP disclosed
US-6000339-A Material for forming silica-base coated insulation film, process for producing the material, silica-base insulation film, semiconductor device, and process for producing the device HITACHI CHEMICAL COMPANY, LTD. (JP) 1999-12-14 US disclosed
EP-0768352-A1 MATERIAL FOR FORMING SILICA-BASE COATED INSULATION FILM, PROCESS FOR PRODUCING THE MATERIAL, SILICA-BASE INSULATION FILM, SEMICONDUCTOR DEVICE, AND PROCESS FOR PRODUCING THE DEVICE HITACHI CHEMICAL CO., LTD. (JP) 1997-04-16 EP disclosed