SCHEMBL2234411

SCHEMBL2234411

c1ccc2cc(Nc3ccc4cc5ccccc5cc4c3)ccc2c1

nearest known ligand 0.78

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.78
CYP3A4 P08684 3/20 0.78
HSD17B10 Q99714 3/20 0.78
HPGD P15428 1/20 0.78
HIF1A Q16665 3/20 0.58
CYP1A2 P05177 2/20 0.58
CYP2C19 P33261 2/20 0.58
CYP2D6 P10635 1/20 0.58
CYP2C9 P11712 1/20 0.58
CA1 P00915 1/20 0.50
CA2 P00918 1/20 0.50
SIRT2 Q8IXJ6 1/20 0.49
SIRT1 Q96EB6 1/20 0.49
SIRT3 Q9NTG7 1/20 0.49
EPHX2 P34913 1/20 0.49
SNCA P37840 1/20 0.48
MAPT P10636 5/20 0.48
NPC1 O15118 2/20 0.48
RAB9A P51151 2/20 0.48
L3MBTL1 Q9Y468 3/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4406769 0.97 ALDH1A1 (0.74) ALDH1A1CYP3A4HSD17B10HPGDHIF1A
SCHEMBL3739909 0.95 ALDH1A1 (0.86) ALDH1A1CYP3A4HSD17B10HPGDHIF1A
SCHEMBL29386674 0.95 ALDH1A1 (0.86) ALDH1A1CYP3A4HSD17B10HPGDHIF1A
SCHEMBL182655 0.95 ALDH1A1 (0.86) ALDH1A1CYP3A4HSD17B10HPGDHIF1A
SCHEMBL39488 0.92 ALDH1A1 (0.91) ALDH1A1CYP3A4HSD17B10HPGDHIF1A
SCHEMBL29352988 0.92 ALDH1A1 (0.91) ALDH1A1CYP3A4HSD17B10HPGDHIF1A
SCHEMBL9513153 0.92 ALDH1A1 (0.91) ALDH1A1CYP3A4HSD17B10HPGDHIF1A
SCHEMBL2794436 0.91 ALDH1A1 (0.87) ALDH1A1CYP3A4HSD17B10HPGDHIF1A
Charcoal, Activated SCHEMBL29831131 0.90 ALDH1A1 (0.86) ALDH1A1CYP3A4HSD17B10HPGDHIF1A
SCHEMBL29673631 0.90 ALDH1A1 (0.86) ALDH1A1CYP3A4HSD17B10HPGDHIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10042258-B2 Composition for forming a resist upper-layer film and method for producing a semiconductor device using the composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-08-07 US disclosed
US-20170293227-A1 COATING LIQUID FOR RESIST PATTERN COATING NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-10-12 US disclosed
US-9746768-B2 Resist overlayer film forming composition for lithography and method for producing semiconductor device using the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-08-29 US disclosed
US-20170205711-A1 COMPOSITION FOR FORMING A RESIST UPPER-LAYER FILM AND METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE USING THE COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-07-20 US disclosed
US-20150362835-A1 RESIST OVERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE USING THE SAME NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-12-17 US disclosed
US-9085537-B2 Photoelectric element and imaging device and driving methods therefor FUJIFILM CORPORATION (JP) 2015-07-21 US disclosed
US-20120298846-A1 PHOTOELECTRIC ELEMENT AND IMAGING DEVICE AND DRIVING METHODS THEREFOR FUJIFILM CORPORATION (JP) 2012-11-29 US disclosed
WO-2011099606-A1 PHOTOELECTRIC ELEMENT AND IMAGING DEVICE AND DRIVING METHODS THEREFOR FUJIFILM CORPORATION (JP) 2011-08-18 WO disclosed