SCHEMBL22374201

SCHEMBL22374201

O=C(O)C1CCC2CC(C(O)O)CCC2C1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PLG P00747 1/20 0.36
PLAT P00750 1/20 0.36
LMNA P02545 1/20 0.36
ACE P12821 1/20 0.36
AKR1C3 P42330 1/20 0.35
AKR1C1 Q04828 1/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
GABRR1 P24046 1/20 0.33
SLC1A2 P43004 3/20 0.32
SLC1A1 P43005 3/20 0.32
CHRNB2 P17787 1/20 0.31
CHRNB4 P30926 1/20 0.31
CHRNA3 P32297 1/20 0.31
CHRNA7 P36544 1/20 0.31
CHRNA4 P43681 1/20 0.31
GABRP O00591 1/20 0.31
GABRD O14764 1/20 0.31
GABRA1 P14867 1/20 0.31
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8150515 0.82 ACE (0.46) PLGPLATLMNAACEAKR1C3
SCHEMBL7859167 0.82 ACE (0.46) PLGPLATLMNAACEAKR1C3
SCHEMBL127054 0.82 ACE (0.46) PLGPLATLMNAACEAKR1C3
Hydrochloric Acid SCHEMBL20943433 0.80 ACE (0.45) PLGPLATLMNAACEAKR1C3
Hydrochloric Acid SCHEMBL9403864 0.80 ACE (0.45) PLGPLATLMNAACEAKR1C3
SCHEMBL15234156 0.78 MEN1 (0.46) PLGPLATLMNAACEAKR1C3
SCHEMBL13453576 0.78 LMNA (0.44) PLGPLATLMNAACEAKR1C3
SCHEMBL1423781 0.78 MEN1 (0.46) PLGPLATLMNAACEAKR1C3
SCHEMBL2905918 0.75 ACE (0.45) PLGPLATLMNAACEAKR1C3
SCHEMBL3892778 0.75 BTK (0.46) LMNAACEAKR1C3AKR1C1GABRR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11415887-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-08-16 US disclosed
US-20200272048-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-08-27 US disclosed