⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL240567 | 0.94 | — | — | |
| Alcohol SCHEMBL27538161 | 0.91 | — | — | |
| SCHEMBL27407489 | 0.90 | — | — | |
| Ammonia Solution, Strong SCHEMBL28329368 | 0.90 | — | — | |
| SCHEMBL8857003 | 0.88 | — | — | |
| Propanol SCHEMBL1011272 | 0.86 | ALDH1A1 (0.30) | — | |
| Methoxymethane SCHEMBL28799153 | 0.85 | — | — | |
| SCHEMBL7046379 | 0.81 | CHRM2 (0.33) | — | |
| SCHEMBL16456459 | 0.81 | — | — | |
| SCHEMBL1867343 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118772130-A | Synthesis method of 3-ethyl-3-oxetane | 中山市千佑化学材料有限公司 | 2024-10-15 | — | — | CN | claimed |
| CN-118772130-A | Synthesis method of 3-ethyl-3-oxetane | 中山市千佑化学材料有限公司 | 2024-10-15 | — | — | CN | disclosed |
| EP-3279278-B1 | INK, IMAGE FORMING METHOD, AND LIQUID DISCHARGING DEVICE | RICOH CO LTD (JP) | 2022-01-26 | — | — | EP | disclosed |
| WO-2021049487-A1 | WATER ABSORBENT RESIN PARTICLES, ABSORBENT ARTICLE, AND PRODUCTION METHOD FOR WATER ABSORBENT RESIN PARTICLES | 住友精化株式会社 | 2021-03-18 | — | — | WO | disclosed |
| WO-2021049488-A1 | WATER-ABSORBING RESIN PARTICLES AND ABSORBENT ARTICLE | 住友精化株式会社 | 2021-03-18 | — | — | WO | disclosed |
| US-10266710-B2 | Ink, image forming method, and liquid discharging device | RICOH COMPANY, LTD. (JP) | 2019-04-23 | — | — | US | disclosed |
| CN-107674499-A | Ink, ink tank, liquid discharge device, image forming method and its device | 株式会社理光 | 2018-02-09 | — | — | CN | disclosed |
| EP-3279278-A1 | INK, IMAGE FORMING METHOD, AND LIQUID DISCHARGING DEVICE | Ricoh Company, Ltd. (JP) | 2018-02-07 | — | — | EP | disclosed |
| US-20180030292-A1 | INK, IMAGE FORMING METHOD, AND LIQUID DISCHARGING DEVICE | RICOH COMPANY, LTD. (JP) | 2018-02-01 | — | — | US | disclosed |
| US-9791776-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-10-17 | — | — | US | disclosed |
| US-8993210-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-03-31 | — | — | US | disclosed |
| US-8940473-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-01-27 | — | — | US | disclosed |
| US-20130022922-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| CN-102890410-A | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL CO | 2013-01-23 | — | — | CN | disclosed |
| US-20120258401-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-11 | — | — | US | disclosed |
| US-20120219904-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20110200936-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-18 | — | — | US | disclosed |