⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10204097 | 1.00 | — | — | |
| SCHEMBL10305010 | 1.00 | — | — | |
| SCHEMBL28041381 | 0.97 | — | — | |
| Ethane SCHEMBL27563219 | 0.97 | — | — | |
| SCHEMBL360480 | 0.83 | — | — | |
| SCHEMBL17188504 | 0.82 | CYP2C9 (0.38) | — | |
| Isobutanol SCHEMBL8331309 | 0.82 | TSHR (0.38) | — | |
| Hydrochloric Acid SCHEMBL20746533 | 0.80 | — | — | |
| SCHEMBL131495 | 0.79 | — | — | |
| SCHEMBL15132817 | 0.78 | ALDH1A1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1007 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12479814-B2 | Process for production of new sulfolenic intermediates | DSM IP ASSETS B.V. (NL) | 2025-11-25 | — | — | US | claimed |
| US-12410117-B2 | Process for production of vitamin A | DSM IP ASSETS B.V. (NL) | 2025-09-09 | — | — | US | claimed |
| CN-111936936-B | Imidazolidinone-containing compositions for removal of post-ash residues and/or for oxide etching of TiN-containing layers or masks | 巴斯夫欧洲公司 | 2025-02-21 | — | — | CN | claimed |
| EP-3684887-B1 | ETCHING SOLUTION FOR SIMULTANEOUSLY REMOVING SILICON AND SILICON-GERMANIUM ALLOY FROM A SILICON-GERMANIUM/SILICON STACK DURING MANUFACTURE OF A SEMICONDUCTOR DEVICE | VERSUM MAT US LLC (US) | 2024-09-25 | — | — | EP | claimed |
| US-12024693-B2 | Imidazolidinethione-containing compositions for post-ash residue removal and/or for oxidative etching of a layer or mask comprising TiN | BASF SE (DE) | 2024-07-02 | — | — | US | claimed |
| WO-2024093747-A1 | COMPOSITE MATERIAL, PREPARATION METHOD FOR THE COMPOSITE MATERIAL, AND PHOTOELECTRIC DEVICE CONTAINING THE COMPOSITE MATERIAL | TCL科技集团股份有限公司 | 2024-05-10 | — | — | WO | claimed |
| CN-117998950-A | Composite material, preparation method of composite material, photoelectric device and electronic equipment | TCL科技集团股份有限公司 | 2024-05-07 | — | — | CN | claimed |
| CN-117998949-A | Composite material, light emitting device and display device including the same | TCL科技集团股份有限公司 | 2024-05-07 | — | — | CN | claimed |
| CN-117998885-A | Metal oxide, light emitting device and display apparatus including the same | TCL科技集团股份有限公司 | 2024-05-07 | — | — | CN | claimed |
| CN-117750860-A | Thin film preparation method, light-emitting device preparation method and electronic equipment | TCL科技集团股份有限公司 | 2024-03-22 | — | — | CN | claimed |
| US-6342332-B1 | ACRYLIC BINDER, MULTIFUNCTIONAL UNSATURATED POLYMERIZABLE MONOMER, PHOTOINITIATOR IN AN AMOUNT GREATER THAN 10%; ETHER SOLVENT; RESISTANT TO BLOCKING; NEGATIVE PHOTORESIST | MACDERMID, INCORPORATED | 2002-01-29 | — | — | US | claimed |
| EP-1091254-A2 | Resist stripping composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-04-11 | — | — | EP | claimed |
| EP-0662529-B1 | Degreasing cleaner and method for cleaning oil-deposited material | MITSUBISHI CHEM CORP (JP) | 1997-10-15 | — | — | EP | claimed |
| US-5674827-A | A THREE COMPONENT AQUEOUS MIXTURE COMPRISING 1,2-BUTANEDIOL, A WATER SOLUBLE ACYCLIC ETHER ALCOHOL, I.E., 1-TERT-BUTOXY-2-BUTANOL AND 4-METHYL-4-HYDROXY-2-PENTANONE; MATERIALS HANDLING; POLLUTION CONTROL | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-10-07 | — | — | US | claimed |
| EP-0662529-A1 | Degreasing cleaner and method for cleaning oil-deposited material | Mitsubishi Chemical Corporation (JP) | 1995-07-12 | — | — | EP | claimed |
| EP-0169816-B1 | SOLUTIONS OF ANIONIC DYES | CIBA-GEIGY AG (CH) | 1992-06-17 | — | — | EP | claimed |
| US-4940492-A | Colorant mixtures containing isoquinoline derivatives, use thereof in printing inks, and novel isoquinoline derivatives | BASF AKTIENGESELLSCHAFT (DE) | 1990-07-10 | — | — | US | claimed |
| US-4648884-A | Solutions of anionic dyes with alkylene glycol mono-alkyl ethers | CIBA-GEIGY CORPORATION (US) | 1987-03-10 | — | — | US | claimed |
| EP-0169816-A2 | Solutions of anionic dyes | CIBA-GEIGY AG (CH) | 1986-01-29 | — | — | EP | claimed |
| US-3948964-A | CYCLIC ETHERS, ETHER ALCOHOLS, CARBOXYLIC ESTERS, KETONES | DYNAMIT NOBEL AKTIENGESELLSCHAFT (DT) | 1976-04-06 | — | — | US | claimed |