SCHEMBL2238592

SCHEMBL2238592

O=C(OCc1ccc(O)cc1)c1ccccc1

nearest known ligand 0.86

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.86
TDP1 Q9NUW8 4/20 0.81
KMT2A Q03164 3/20 0.81
SLC6A2 P23975 1/20 0.81
SLC6A3 Q01959 1/20 0.81
MEN1 O00255 1/20 0.81
NPC1 O15118 1/20 0.64
RAB9A P51151 1/20 0.64
ESR1 P03372 2/20 0.62
ESR2 Q92731 2/20 0.62
ALDH1A1 P00352 3/20 0.58
MAPT P10636 1/20 0.58
HPGD P15428 1/20 0.58
CYP1A2 P05177 1/20 0.54
CYP3A4 P08684 1/20 0.54
CYP2C9 P11712 1/20 0.54
CYP2C19 P33261 1/20 0.54
NPSR1 Q6W5P4 1/20 0.54
L3MBTL1 Q9Y468 1/20 0.54
MAPK1 P28482 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21056179 0.98 LMNA (0.83) LMNATDP1KMT2ASLC6A2SLC6A3
SCHEMBL6399951 0.95 LMNA (0.77) LMNATDP1KMT2ASLC6A2SLC6A3
SCHEMBL5085718 0.94 KMT2A (0.92) LMNATDP1KMT2ASLC6A2SLC6A3
SCHEMBL27578 0.92 LMNA (1.00) LMNATDP1KMT2ASLC6A2SLC6A3
SCHEMBL2519911 0.91 LMNA (0.96) LMNATDP1KMT2ASLC6A2SLC6A3
Hydrochloric Acid SCHEMBL28511050 0.91 LMNA (0.96) LMNATDP1KMT2ASLC6A2SLC6A3
Benzyl Benzoate SCHEMBL8010992 0.90 KMT2A (1.00) LMNATDP1KMT2ASLC6A2SLC6A3
Benzyl Benzoate SCHEMBL901058 0.90 KMT2A (1.00) LMNATDP1KMT2ASLC6A2SLC6A3
Benzyl Benzoate SCHEMBL3038 0.90 KMT2A (1.00) LMNATDP1KMT2ASLC6A2SLC6A3
SCHEMBL29245494 0.90 KMT2A (1.00) LMNATDP1KMT2ASLC6A2SLC6A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 132 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-58045092-A None JP disclosed
JP-1036485-A None JP disclosed
JP-6166263-A None JP disclosed
CN-221638132-U 4-Hydroxy-4' -isopropoxy diphenyl sulfone synthesizing equipment 江苏傲伦达科技实业股份有限公司 2024-09-03 CN disclosed
CN-116373485-A Thermosensitive developer dispersion liquid and thermosensitive recording material 乐凯医疗科技有限公司 2023-07-04 CN disclosed
US-11524514-B2 Tamper-proof medium for thermal printing OMYA INTERNATIONAL AG (CH) 2022-12-13 US disclosed
CN-115073468-A Preparation and application of imidazopyrazine BTK inhibitor 药雅科技(上海)有限公司 2022-09-20 CN disclosed
CN-110799345-B Tamper-resistant media for thermal printing 欧米亚国际集团 2022-04-19 CN disclosed
CN-110305016-B One-step preparation of 4-hydroxybenzyl benzaldehyde carbonate QINGDAO UNIVERSITY OF SCIENCE AND TECHNOLOGY (CN) 2021-08-31 CN disclosed
EP-3642044-B1 TAMPER-PROOF MEDIUM FOR THERMAL PRINTING OMYA INT AG (CH) 2021-07-28 EP disclosed
EP-0364120-B1 A CYCLOALKENE COMPOUND AND A RECORDING MATERIAL USING THE COMPOUND HODOGAYA CHEMICAL COMPANY, LIMITED (JP) 1993-08-11 EP disclosed
US-5130291-A HEAT-SENSITIVE RECORDING PAPER OSAKA SEALING PRINTING CO., LTD. (JP) 1992-07-14 US disclosed
US-5120702-A 4-hydroxy-4*-prpoxydiphenyl sulfone and stabilizer JUJO PAPER CO., LTD. (JP) 1992-06-09 US disclosed
EP-0410721-A2 Heat-sensitive recording material NIPPON PAPER INDUSTRIES CO., LTD. (JP) 1991-01-30 EP disclosed
US-4987262-A Absorbers of near infrared radiation, chromogens HODOGAYA CHEMICAL CO., LTD. (JP) 1991-01-22 US disclosed
EP-0364120-A2 A cycloalkene compound and a recording material using the compound HODOGAYA CHEMICAL COMPANY, LIMITED (JP) 1990-04-18 EP disclosed
JP-S6436485-A THERMOSENSITIVE RECORDING SHEET OJI PAPER CO 1989-02-07 JP disclosed
US-4642357-A FLUORAN DERIVATIVES SHIN NISSO KAKO CP., LTD. (JP) 1987-02-10 US disclosed
US-4438001-A ANTISTATIC AGENTS TAKEMOTOYUSHI CO. LTD. (JP) 1984-03-20 US disclosed
JP-S5845092-A HEAT-SENSITIVE RECORDING MATERIAL RICOH CO LTD 1983-03-16 JP disclosed