⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10178619 | 0.84 | HMGCR (0.33) | — | |
| SCHEMBL12227573 | 0.81 | NPC1 (0.31) | — | |
| SCHEMBL22402836 | 0.79 | MAPT (0.48) | — | |
| SCHEMBL20691765 | 0.79 | — | — | |
| SCHEMBL12256174 | 0.78 | NPC1 (0.31) | — | |
| SCHEMBL13497472 | 0.78 | CHRM2 (0.41) | — | |
| SCHEMBL15147014 | 0.77 | CHRM2 (0.41) | — | |
| SCHEMBL9916131 | 0.76 | ALDH1A1 (0.31) | — | |
| SCHEMBL10035501 | 0.76 | CA1 (0.32) | — | |
| SCHEMBL13890234 | 0.75 | SLC18A3 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11009793-B2 | Monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-05-18 | — | — | US | disclosed |
| US-20200369605-A1 | ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-11-26 | — | — | US | disclosed |
| US-20200283400-A1 | EPOXY COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-09-10 | — | — | US | disclosed |